Predicted protein targets (top 8)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | HSD11B1 | P28845 | 1/20 | 0.41 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.38 |
| ▸ | EPHX2 | P34913 | 4/20 | 0.35 |
| ▸ | SIGMAR1 | Q99720 | 1/20 | 0.35 |
| ▸ | CYP2C9 | P11712 | 1/20 | 0.35 |
| ▸ | CXCR3 | P49682 | 2/20 | 0.32 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.32 |
| ▸ | NPSR1 | Q6W5P4 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL191696 | 0.84 | HSD11B1 (0.38) | HSD11B1L3MBTL1EPHX2SIGMAR1CYP2C9 | |
| SCHEMBL7099148 | 0.82 | EPHX2 (0.41) | HSD11B1L3MBTL1EPHX2SIGMAR1ALDH1A1 | |
| SCHEMBL27620612 | 0.80 | EPHX2 (0.42) | HSD11B1L3MBTL1EPHX2ALDH1A1NPSR1 | |
| SCHEMBL7712675 | 0.80 | EPHX2 (0.42) | HSD11B1L3MBTL1EPHX2ALDH1A1NPSR1 | |
| Methacrylic Acid SCHEMBL28236245 | 0.80 | HSD11B1 (0.46) | HSD11B1L3MBTL1EPHX2NPSR1 | |
| SCHEMBL39664 | 0.77 | HSD11B1 (0.44) | HSD11B1L3MBTL1EPHX2SIGMAR1CYP2C9 | |
| SCHEMBL6912960 | 0.74 | HSD11B1 (0.42) | HSD11B1L3MBTL1EPHX2CYP2C9CXCR3 | |
| SCHEMBL6657914 | 0.74 | HSD11B1 (0.42) | HSD11B1L3MBTL1EPHX2CYP2C9CXCR3 | |
| SCHEMBL19594418 | 0.72 | HSD11B1 (0.41) | HSD11B1SIGMAR1CYP2C9ALDH1A1 | |
| SCHEMBL2747594 | 0.72 | HSD11B1 (0.46) | HSD11B1EPHX2SIGMAR1CYP2C9 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 207 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8722321-B2 | Patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2014-05-13 | — | — | US | claimed |
| US-20120276485-A1 | PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2012-11-01 | — | — | US | claimed |
| US-20120270159-A1 | PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2012-10-25 | — | — | US | claimed |
| EP-2287671-B1 | Process for forming a coated substrate | COMMW SCIENT IND RES ORG (AU) | 2012-06-06 | — | — | EP | claimed |
| US-20100239982-A1 | Photoresist composition with high etching resistance | CHEIL INDUSTRIES, INC. (KR) | 2010-09-23 | — | — | US | claimed |
| US-20100233620-A1 | Copolymer and photoresist composition including the same | CHEIL INDUSTRIES, INC. (KR) | 2010-09-16 | — | — | US | claimed |
| US-7604918-B2 | Photosensitive polymer and photoresist composition having the same | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2009-10-20 | — | — | US | claimed |
| WO-2009069848-A1 | NOVEL COPOLYMERS AND PHOTORESIST COMPOSITION INCLUDING THE SAME | CHEIL INDUSTRIES INC. (KR) | 2009-06-04 | — | — | WO | claimed |
| WO-2009069847-A1 | PHOTORESIST COMPOSITION WITH HIGH ETCHING RESISTANCE | CHEIL INDUSTRIES INC. (KR) | 2009-06-04 | — | — | WO | claimed |
| US-20070172760-A1 | Photosensitive polymer and photoresist composition having the same | SAMSUNG ELECTRONICS CO. LTD | 2007-07-26 | — | — | US | claimed |
| US-6916543-B2 | Copolymer, photoresist compositions thereof and deep UV bilayer system thereof | ARCH SPECIALTY CHEMICALS, INC. (US) | 2005-07-12 | — | — | US | claimed |
| US-6849378-B2 | Photosensitive polymers, resist compositions comprising the same, and methods for forming photoresistive patterns | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2005-02-01 | — | — | US | claimed |
| US-6833230-B2 | Good adhesion and resistance to dry etching | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2004-12-21 | — | — | US | claimed |
| US-6777162-B2 | 10-90 MOL % OF AN ALKYL VINYL ETHER MONOMER AND 10-90 MOL % OF ACRYLATE, METHACRYLATE, FUMARATE AND 4-HYDROXYSTYRENE DERIVATIVES | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2004-08-17 | — | — | US | claimed |
| US-20040137362-A1 | Novel copolymer, photoresist compositions thereof and deep UV bilayer system thereof | ARCH SPECIALTY CHEMICALS, INC. | 2004-07-15 | — | — | US | claimed |
| WO-2004040371-A2 | NOVEL COPOLYMER AND PHOTORESIST COMPOSITIONS THEREOF | ARCH SPECIALTY CHEMICALS, INC. (US) | 2004-05-13 | — | — | WO | claimed |
| US-20030224289-A1 | Photosensitive polymers and resist compositions containing the same | SAMSUNG ELECTRONICS CO., LTD. | 2003-12-04 | — | — | US | claimed |
| US-20030203306-A1 | Photosensitive polymers, resist compositions comprising the same, and methods for forming photoresistive patterns | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2003-10-30 | — | — | US | claimed |
| US-20030194643-A1 | Photosensitive polymers containing adamantylalkyl vinyl ether, and resist compositions including the same | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2003-10-16 | — | — | US | claimed |
| US-20030091928-A1 | Photosensitive polymer and photoresist composition thereof | SAMSUNG ELECTRONICS, CO., LTD. (KR) | 2003-05-15 | — | — | US | claimed |