Predicted protein targets (top 7)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | HSD11B1 | P28845 | 1/20 | 0.44 |
| ▸ | CYP2C9 | P11712 | 1/20 | 0.38 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.35 |
| ▸ | CXCR3 | P49682 | 3/20 | 0.33 |
| ▸ | EPHX2 | P34913 | 2/20 | 0.33 |
| ▸ | NPSR1 | Q6W5P4 | 1/20 | 0.32 |
| ▸ | SIGMAR1 | Q99720 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL6657914 | 0.97 | HSD11B1 (0.42) | HSD11B1CYP2C9L3MBTL1CXCR3EPHX2 | |
| SCHEMBL6912960 | 0.97 | HSD11B1 (0.42) | HSD11B1CYP2C9L3MBTL1CXCR3EPHX2 | |
| SCHEMBL14202660 | 0.82 | HSD11B1 (0.37) | HSD11B1CYP2C9L3MBTL1CXCR3 | |
| Acrylic Acid SCHEMBL27134396 | 0.78 | HSD11B1 (0.48) | HSD11B1L3MBTL1EPHX2NPSR1 | |
| Methacrylic Acid SCHEMBL3906229 | 0.78 | HSD11B1 (0.48) | HSD11B1CYP2C9L3MBTL1EPHX2NPSR1 | |
| SCHEMBL190682 | 0.77 | HSD11B1 (0.41) | HSD11B1CYP2C9L3MBTL1CXCR3EPHX2 | |
| Ammonia Solution, Strong SCHEMBL28565322 | 0.76 | HSD11B1 (0.37) | HSD11B1CYP2C9L3MBTL1 | |
| SCHEMBL191696 | 0.73 | HSD11B1 (0.38) | HSD11B1CYP2C9L3MBTL1EPHX2NPSR1 | |
| SCHEMBL92295 | 0.71 | HSD11B1 (0.37) | HSD11B1CYP2C9L3MBTL1 | |
| SCHEMBL14642668 | 0.71 | HSD11B1 (0.37) | HSD11B1CYP2C9L3MBTL1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Appears in 3192 patents — a generic fragment claimed broadly, so it's down-weighted as IP noise. Top by claim status then date:
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-116003204-B | Method for preparing alkyladamantane by acenaphthene hydrogenation ring isomerization | 大连理工大学 | 2025-03-14 | — | — | CN | claimed |
| CN-117265875-A | Treating agent and fiber fabric or coating | 北京马普新材料有限公司 | 2023-12-22 | — | — | CN | claimed |
| US-20230408918-A1 | PHOTORESIST COMPOSITION AND METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE | TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. (TW) | 2023-12-21 | — | — | US | claimed |
| US-20230384683-A1 | PHOTORESIST WITH POLAR-ACID-LABILE-GROUP | TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD. (TW) | 2023-11-30 | — | — | US | claimed |
| US-11822251-B2 | Photoresist with polar-acid-labile-group | TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD. (TW) | 2023-11-21 | — | — | US | claimed |
| CN-117089028-A | Organic fluorine/silicon modified acrylic resin, method for producing same, antifouling composition containing same, and use thereof | 大金氟化工（中国）有限公司 | 2023-11-21 | — | — | CN | claimed |
| WO-2023195225-A1 | FLUORINE-CONTAINING POLYMER AND FLUORINE-CONTAINING COMPOSITION | ダイキン工業株式会社 | 2023-10-12 | — | — | WO | claimed |
| CN-111499905-B | Fluoropolymer, coating composition, method for producing coated article, and coated article | 大金工业株式会社 | 2023-08-18 | — | — | CN | claimed |
| CN-113544224-B | Inkjet ink composition, image recording method, and image recorded matter | 富士胶片株式会社 | 2023-05-23 | — | — | CN | claimed |
| CN-113454132-B | Ultraviolet-absorbing polymer, molding resin composition, and molded article | 东洋油墨SC控股株式会社 | 2023-05-09 | — | — | CN | claimed |
| EP-1225479-A2 | Chemical amplifying type positive resist composition | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2002-07-24 | — | — | EP | claimed |
| US-20020042016-A1 | Resist composition comprising photosensitive polymer having loctone in its backbone | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2002-04-11 | — | — | US | claimed |
| US-20010044070-A1 | Chemically amplified positive resist composition | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2001-11-22 | — | — | US | claimed |
| EP-1143299-A1 | Chemically amplified positive resist composition | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2001-10-10 | — | — | EP | claimed |
| CN-1316675-A | Chemical amplifying type positive photoetching rubber composition | SUMITOMO CHEMICAL CO (JP) | 2001-10-10 | — | — | CN | claimed |
| US-20010024763-A1 | Photosensitive polymer including copolymer of alkyl vinyl ether and resist composition containing the same | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2001-09-27 | — | — | US | claimed |
| EP-1120689-A2 | Photosensitive copolymers of alkyl vinyl ether and resist compositions containing the same | SAMSUNG ELECTRONICS CO. LTD. (KR) | 2001-08-01 | — | — | EP | claimed |
| US-6239231-B1 | HAS THE POLYMERIZATION UNIT OF 2-ALKYL-2-ADAMANTYL (METH)ACRYLATE AND ONE OR BOTH OF THE POLYMERIZATION UNIT OF 3-HYDROXY-1-ADAMANTYL (METH)ACRYLATE OR (METH)ACRYLONITRILE; ACID GENERATOR; SEMICONDUCTORS | SUMITOMO CHEMICAL, COMPANY LIMITED (JP) | 2001-05-29 | — | — | US | claimed |
| EP-1078945-A2 | Polymer for use in a photoresist composition | SAMSUNG ELECTRONICS CO. LTD. (KR) | 2001-02-28 | — | — | EP | claimed |
| EP-0982628-A2 | A chemical amplifying type positive resist composition | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2000-03-01 | — | — | EP | claimed |