SCHEMBL191696

SCHEMBL191696

CCCCC1C2CC3CC(C2)CC1C3

nearest known ligand 0.44

Predicted protein targets (top 10)

geneUniProtsupporting neighboursconfidence
HSD11B1 P28845 1/20 0.38
EPHX2 P34913 4/20 0.38
CYP1A2 P05177 1/20 0.36
L3MBTL1 Q9Y468 1/20 0.35
NPSR1 Q6W5P4 1/20 0.35
SIGMAR1 Q99720 1/20 0.33
CYP2C9 P11712 1/20 0.32
GLB1 P16278 1/20 0.31
USP2 O75604 1/20 0.30
ALDH1A1 P00352 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL7099148 0.93 EPHX2 (0.41) HSD11B1EPHX2L3MBTL1NPSR1SIGMAR1
SCHEMBL27620612 0.91 EPHX2 (0.42) HSD11B1EPHX2CYP1A2L3MBTL1NPSR1
SCHEMBL7712675 0.91 EPHX2 (0.42) HSD11B1EPHX2CYP1A2L3MBTL1NPSR1
SCHEMBL190682 0.84 HSD11B1 (0.41) HSD11B1EPHX2L3MBTL1NPSR1SIGMAR1
SCHEMBL14119129 0.76 CYP1A2 (0.30) CYP1A2
Methacrylic Acid SCHEMBL15284344 0.75 EPHX2 (0.42) HSD11B1EPHX2L3MBTL1NPSR1ALDH1A1
SCHEMBL11715655 0.75 GRIN2D (0.38) HSD11B1SIGMAR1CYP2C9
SCHEMBL11723424 0.75 HSD11B1 (0.38) HSD11B1SIGMAR1CYP2C9
SCHEMBL5256611 0.75 HSD11B1 (0.38) HSD11B1SIGMAR1CYP2C9
SCHEMBL5164436 0.75 HSD11B1 (0.34) HSD11B1EPHX2SIGMAR1ALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 108 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7261992-B2 Fluorinated silsesquioxane polymers and use thereof in lithographic photoresist compositions INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 2007-08-28 US claimed
EP-1558654-A4 NOVEL COPOLYMER, PHOTORESIST COMPOSITIONS THEREOF AND DEEP UV BILAYER SYSTEM THEREOF FUJIFILM ELECTRONIC MATERIALS (US) 2006-04-05 EP claimed
EP-1558654-A2 NOVEL COPOLYMER, PHOTORESIST COMPOSITIONS THEREOF AND DEEP UV BILAYER SYSTEM THEREOF Fujifilm Electronic Materials USA, Inc. (US) 2005-08-03 EP claimed
US-6916543-B2 Copolymer, photoresist compositions thereof and deep UV bilayer system thereof ARCH SPECIALTY CHEMICALS, INC. (US) 2005-07-12 US claimed
US-20040137362-A1 Novel copolymer, photoresist compositions thereof and deep UV bilayer system thereof ARCH SPECIALTY CHEMICALS, INC. 2004-07-15 US claimed
WO-2004040371-A2 NOVEL COPOLYMER AND PHOTORESIST COMPOSITIONS THEREOF ARCH SPECIALTY CHEMICALS, INC. (US) 2004-05-13 WO claimed
US-20240069440-A1 PHOTORESIST FILM AND APPLICATION THEREOF CHANG CHUN PLASTICS CO., LTD. (TW) 2024-02-29 US disclosed
CN-109799680-B Chemically amplified positive photosensitive resin composition and use thereof 奇美实业股份有限公司 2023-03-10 CN disclosed
WO-2021002375-A1 SEALANT FOR ORGANIC EL DISPLAY ELEMENT 積水化学工業株式会社 2021-01-07 WO disclosed
CN-109799680-A Chemical amplification positive photosensitive resin composition and its application 奇美实业股份有限公司 2019-05-24 CN disclosed
EP-1708027-B1 UPPER LAYER FILM FORMING COMPOSITION FOR LIQUID IMMERSION AND METHOD OF FORMING PHOTORESIST PATTERN JSR CORP (JP) 2019-03-13 EP disclosed
US-20160070162-A1 OPTICAL MASK AND METHOD OF MANUFACTURING THE OPTICAL MASK SAMSUNG DISPLAY CO., LTD. (KR) 2016-03-10 US disclosed
EP-2331495-B1 PROCESS FOR MANUFACTURING ADAMANTANE DERIVATIVES WITH HIGH YIELD MERZ PHARMA GMBH & CO KGAA (DE) 2016-01-27 EP disclosed
CN-1429195-A Process for producing 2-alkyl-2-adamantyl ester TOKUYAMA CORP (JP) 2003-07-09 CN disclosed
US-20030120106-A1 Reacting a solution of a lithium 2-alkyl-2-adamantyl alcoholate to a (meth)acryloyl halide to produce 2-alkyl-2-admantyl (meth)acrylate TOKUYAMA CORPORATION (JP) 2003-06-26 US disclosed
EP-1283198-A1 PROCESS FOR PRODUCING 2-ALKYL-2-ADAMANTYL ESTER TOKUYAMA CORPORATION (JP) 2003-02-12 EP disclosed
US-20020090572-A1 Substantially transparent aqueous base soluble polymer system for use in 157 nm resist applications GLOBALFOUNDRIES U.S. INC. 2002-07-11 US disclosed
US-20020081520-A1 Substantially transparent aqueous base soluble polymer system for use in 157 nm resist applications GLOBALFOUNDRIES INC. (KY) 2002-06-27 US disclosed
US-6369101-B1 Therapeutic method to treat herpes virus infection REGENTS OF THE UNIVERSITY OF MINNESOTA 2002-04-09 US disclosed
WO-1998034603-A1 USE OF BETULIN AND ANALOGS THEREOF TO TREAT HERPESVIRUS INFECTION REGENTS OF THE UNIVERSITY OF MINNESOTA (US) 1998-08-13 WO disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20030120106-A1 Reacting a solution of a lithium 2-alkyl-2-adamantyl alcoholate to a (meth)acryloyl halide to produce 2-alkyl-2-admantyl (meth)acrylate ADH1A, ADH5, ANO2 HSD11B1 409/4885EPHX2 3443/4885CYP1A2 399/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.