SCHEMBL19084292

SCHEMBL19084292

CCC(C)(CC)C(C)c1ccc2cc(O)ccc2c1

nearest known ligand 0.53

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CYP2C9 P11712 2/20 0.52
HSD17B10 Q99714 2/20 0.52
CYP1A2 P05177 2/20 0.38
RAD52 P43351 1/20 0.37
UGT2B7 P16662 1/20 0.37
AKR1C3 P42330 2/20 0.36
AKR1C2 P52895 2/20 0.36
PTPN1 P18031 1/20 0.36
ESR1 P03372 3/20 0.36
CYP3A4 P08684 2/20 0.36
ALOX15 P16050 2/20 0.36
TDP1 Q9NUW8 2/20 0.36
SLC6A2 P23975 2/20 0.36
SLC6A3 Q01959 2/20 0.36
ESR2 Q92731 2/20 0.36
TSHR P16473 1/20 0.36
HIF1A Q16665 1/20 0.36
LMNA P02545 1/20 0.36
PGR P06401 1/20 0.36
CHRM2 P08172 1/20 0.36

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL19084288 0.87 CYP2C9 (0.52) CYP2C9HSD17B10CYP1A2RAD52UGT2B7
SCHEMBL12812115 0.82 CYP2C9 (0.50) CYP2C9HSD17B10CYP1A2UGT2B7ESR1
SCHEMBL2629346 0.82 ESR1 (0.48) CYP2C9CYP1A2ESR1CYP3A4ALOX15
SCHEMBL19454925 0.77 TDP1 (0.46) HSD17B10CYP1A2CYP3A4ALOX15TDP1
SCHEMBL86085 0.75 HSD17B10 (0.54) CYP2C9HSD17B10CYP1A2RAD52UGT2B7
SCHEMBL20398782 0.74 CYP1A2 (0.50) CYP2C9HSD17B10CYP1A2UGT2B7ESR1
SCHEMBL487450 0.74 CYP1A2 (0.56) CYP2C9HSD17B10CYP1A2UGT2B7ESR1
SCHEMBL20643219 0.74 CYP2C9 (0.49) CYP2C9HSD17B10CYP1A2UGT2B7AKR1C3
SCHEMBL21709894 0.72 ESR1 (0.52) CYP2C9HSD17B10CYP1A2RAD52UGT2B7
SCHEMBL18350082 0.72 HSD17B10 (0.51) CYP2C9HSD17B10CYP1A2RAD52UGT2B7

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2017115978-A1 ORGANIC FILM COMPOSITION AND PATTERN FORMING METHOD 삼성에스디아이 주식회사 2017-07-06 WO disclosed