SCHEMBL19084288

SCHEMBL19084288

CCC(C)(C)C(C)c1ccc2cc(O)ccc2c1

nearest known ligand 0.52

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CYP2C9 P11712 3/20 0.52
HSD17B10 Q99714 2/20 0.52
CYP1A2 P05177 2/20 0.38
AKR1C3 P42330 2/20 0.38
AKR1C2 P52895 2/20 0.38
CYP2C19 P33261 2/20 0.37
CYP17A1 P05093 1/20 0.37
RAD52 P43351 1/20 0.37
UGT2B7 P16662 1/20 0.37
PTPN1 P18031 1/20 0.36
ESR1 P03372 3/20 0.36
CYP3A4 P08684 2/20 0.36
ALOX15 P16050 2/20 0.36
TDP1 Q9NUW8 2/20 0.36
ESR2 Q92731 2/20 0.36
TSHR P16473 1/20 0.36
HIF1A Q16665 1/20 0.36
LMNA P02545 1/20 0.36
PGR P06401 1/20 0.36
CHRM2 P08172 1/20 0.36

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL19084292 0.87 CYP2C9 (0.52) CYP2C9HSD17B10CYP1A2AKR1C3AKR1C2
SCHEMBL12812115 0.82 CYP2C9 (0.50) CYP2C9HSD17B10CYP1A2CYP2C19CYP17A1
SCHEMBL2629474 0.82 ESR1 (0.48) CYP2C9CYP1A2CYP2C19ESR1CYP3A4
SCHEMBL487450 0.78 CYP1A2 (0.56) CYP2C9HSD17B10CYP1A2CYP2C19UGT2B7
SCHEMBL19153487 0.77 TDP1 (0.46) HSD17B10CYP1A2CYP2C19CYP3A4ALOX15
SCHEMBL86085 0.75 HSD17B10 (0.54) CYP2C9HSD17B10CYP1A2AKR1C3AKR1C2
SCHEMBL12356631 0.74 ESR1 (0.50) CYP2C9HSD17B10CYP1A2UGT2B7ESR1
SCHEMBL20398782 0.74 CYP1A2 (0.50) CYP2C9HSD17B10CYP1A2CYP2C19UGT2B7
SCHEMBL20643219 0.74 CYP2C9 (0.49) CYP2C9HSD17B10CYP1A2AKR1C3AKR1C2
SCHEMBL18350082 0.72 HSD17B10 (0.51) CYP2C9HSD17B10CYP1A2AKR1C3AKR1C2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 10 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11069557-B2 Method for producing thin wafer SHIN-ETSU CHEMICAL CO., LTD. (JP) 2021-07-20 US disclosed
US-10658314-B2 Wafer laminate, method for production thereof, and adhesive composition for wafer laminate SHIN-ETSU CHEMICAL CO., LTD. (JP) 2020-05-19 US disclosed
US-20200075388-A1 METHOD FOR PRODUCING THIN WAFER SHIN-ETSU CHEMICAL CO., LTD. (JP) 2020-03-05 US disclosed
US-10553552-B2 Wafer laminate and method of producing the same SHIN-ETSU CHEMICAL CO., LTD. (JP) 2020-02-04 US disclosed
US-10373903-B2 Laminate and making method SHIN-ETSU CHEMICAL CO., LTD. (JP) 2019-08-06 US disclosed
US-10297485-B2 Semiconductor device, making method, and laminate SHIN-ETSU CHEMICAL CO., LTD. (JP) 2019-05-21 US disclosed
US-20180102334-A1 WAFER LAMINATE AND METHOD OF PRODUCING THE SAME SHIN-ETSU CHEMICAL CO., LTD. (JP) 2018-04-12 US disclosed
US-20180102333-A1 WAFER LAMINATE, METHOD FOR PRODUCTION THEREOF, AND ADHESIVE COMPOSITION FOR WAFER LAMINATE SHIN-ETSU CHEMICAL CO., LTD. (JP) 2018-04-12 US disclosed
US-20170352637-A1 WAFER LAMINATE AND MAKING METHOD SHIN-ETSU CHEMICAL CO., LTD. (JP) 2017-12-07 US disclosed
WO-2017115978-A1 ORGANIC FILM COMPOSITION AND PATTERN FORMING METHOD 삼성에스디아이 주식회사 2017-07-06 WO disclosed