SCHEMBL19084530

SCHEMBL19084530

CCC(C)(C)C(=O)OC1(C)CCCOC1=O

nearest known ligand 0.36

Predicted protein targets (top 2)

geneUniProtsupporting neighboursconfidence
FKBP1A P62942 2/20 0.36
SMN1; SMN2 Q16637 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL47559 0.91 FKBP1A (0.32) FKBP1ASMN1; SMN2
SCHEMBL686107 0.84
SCHEMBL879235 0.79 SMN1; SMN2 (0.32) SMN1; SMN2
SCHEMBL13219645 0.79
SCHEMBL12872930 0.77 LMNA (0.32)
SCHEMBL16065397 0.77 FKBP1A (0.32) FKBP1A
SCHEMBL686468 0.76 ALDH1A1 (0.30)
SCHEMBL16591054 0.76
SCHEMBL12018273 0.75
SCHEMBL13817658 0.75 SMN1; SMN2 (0.36) SMN1; SMN2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20170192355-A1 METHOD FOR FORMING NEGATIVE TONE PATTERN, METHOD FOR MANUFACTURING ELECTRONIC DEVICE, AND ACTIVE-LIGHT-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION FUJIFILM CORPORATION (JP) 2017-07-06 US disclosed