SCHEMBL19102491

SCHEMBL19102491

CCCCCCCCCCCCOCc1cc(O)cc(CO)c1

nearest known ligand 0.49

Predicted protein targets (top 12)

geneUniProtsupporting neighboursconfidence
PTGS2 P35354 4/20 0.49
CYP3A4 P08684 1/20 0.46
ACHE P22303 1/20 0.45
CNR1 P21554 6/20 0.44
CNR2 P34972 4/20 0.44
MEN1 O00255 1/20 0.43
THRB P10828 1/20 0.43
HTT P42858 1/20 0.43
KMT2A Q03164 1/20 0.43
MAPT P10636 1/20 0.43
NR5A1 Q13285 1/20 0.42
GPR84 Q9NQS5 2/20 0.42

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL12215159 0.93 PTGS2 (0.55) PTGS2CYP3A4CNR1CNR2MEN1
SCHEMBL12215160 0.93 PTGS2 (0.55) PTGS2CYP3A4CNR1CNR2MEN1
SCHEMBL10141517 0.88 PTGS2 (0.50) PTGS2CYP3A4ACHECNR1CNR2
SCHEMBL10141520 0.88 PTGS2 (0.50) PTGS2CYP3A4ACHECNR1CNR2
SCHEMBL19323300 0.83 PLA2G2A (0.54)
SCHEMBL9479894 0.82 PLA2G4B (0.47) MEN1THRBHTTKMT2AMAPT
SCHEMBL3844534 0.81 MEN1 (0.47) PTGS2CYP3A4ACHEMEN1THRB
SCHEMBL4598914 0.81 MEN1 (0.47) PTGS2CYP3A4ACHEMEN1THRB
SCHEMBL10427861 0.81 MEN1 (0.47) PTGS2CYP3A4ACHEMEN1THRB
SCHEMBL9281683 0.81 MEN1 (0.47) PTGS2CYP3A4ACHEMEN1THRB

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9798235-B2 Positive type resist composition for use in liquid immersion exposure and a method of forming the pattern using the same FUJIFILM CORPORATION (JP) 2017-10-24 US disclosed
US-20170255098-A1 POSITIVE TYPE RESIST COMPOSITION FOR USE IN LIQUID IMMERSION EXPOSURE AND A METHOD OF FORMING THE PATTERN USING THE SAME FUJIFILM CORPORATION (JP) 2017-09-07 US disclosed
US-9703196-B2 Positive type resist composition for use in liquid immersion exposure and a method of forming the pattern using the same FUJIFILM CORPORATION (JP) 2017-07-11 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20170255098-A1 POSITIVE TYPE RESIST COMPOSITION FOR USE IN LIQUID IMMERSION EXPOSURE AND A METHOD OF FORMING THE PATTERN USING THE SAME POLR2H, POLQ, RXRA PTGS2 2890/4885CYP3A4 4654/4885ACHE 4637/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.