Predicted protein targets (top 3)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.36 |
| ▸ | LMNA | P02545 | 1/20 | 0.36 |
| ▸ | EPHX2 | P34913 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL4384475 | 0.69 | GABRR1 (0.30) | — | |
| SCHEMBL6161898 | 0.68 | KDM4E (0.61) | KDM4ELMNAEPHX2 | |
| SCHEMBL21705290 | 0.68 | KDM4E (0.61) | KDM4ELMNAEPHX2 | |
| SCHEMBL6382754 | 0.68 | KDM4E (0.61) | KDM4ELMNAEPHX2 | |
| SCHEMBL75505 | 0.68 | KDM4E (0.61) | KDM4ELMNAEPHX2 | |
| SCHEMBL24004713 | 0.68 | KDM4E (0.61) | KDM4ELMNAEPHX2 | |
| SCHEMBL900095 | 0.68 | KDM4E (0.61) | KDM4ELMNAEPHX2 | |
| SCHEMBL16898630 | 0.68 | KDM4E (0.61) | KDM4ELMNAEPHX2 | |
| SCHEMBL5431682 | 0.68 | KDM4E (0.61) | KDM4ELMNAEPHX2 | |
| SCHEMBL5058845 | 0.68 | KDM4E (0.61) | KDM4ELMNAEPHX2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 16 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20080015278-A1 | Metal-Containing Compositions and Method of Making Same | PRYOG, LLC | 2008-01-17 | — | — | US | claimed |
| WO-2007070092-A2 | METAL-CONTAINING COMPOSITIONS AND METHOD OF MAKING SAME | PRYOG, LLC (US) | 2007-06-21 | — | — | WO | claimed |
| EP-2326744-B1 | METAL COMPOSITIONS AND METHODS OF MAKING SAME | PRYOG LLC (US) | 2022-06-01 | — | — | EP | disclosed |
| US-9499646-B2 | Negative resist composition, method of forming resist pattern and complex | TOKYO OHKA KOGYO CO., LTD. (JP) | 2016-11-22 | — | — | US | disclosed |
| US-20160259244-A1 | NEGATIVE RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN AND COMPLEX | TOKYO OHKA KOGYO CO LTD (JP) | 2016-09-08 | — | — | US | disclosed |
| US-9366960-B2 | Negative resist composition, method of forming resist pattern, and complex | TOKYO OHA KOGYO CO., LTD. (JP) | 2016-06-14 | — | — | US | disclosed |
| US-20150192851-A1 | NEGATIVE RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, AND COMPLEX | TOKYO OHKA KOGYO CO, LTD. (JP) | 2015-07-09 | — | — | US | disclosed |
| US-8802346-B2 | Metal compositions and methods of making same | PRYOG, LLC (US) | 2014-08-12 | — | — | US | disclosed |
| US-8709705-B2 | Metal-containing compositions and method of making same | PRYOG, LLC (US) | 2014-04-29 | — | — | US | disclosed |
| US-20120315451-A1 | Metal-Containing Compositions and Method of Making Same | PRYOG LLC | 2012-12-13 | — | — | US | disclosed |
| US-20110184139-A1 | METAL COMPOSITIONS AND METHODS OF MAKING SAME | PRYOG, LLC | 2011-07-28 | — | — | US | disclosed |
| EP-2326744-A1 | METAL COMPOSITIONS AND METHODS OF MAKING SAME | Pryog LLC (US) | 2011-06-01 | — | — | EP | disclosed |
| WO-2010059174-A1 | METAL COMPOSITIONS AND METHODS OF MAKING SAME | PRYOG, LLC (US) | 2010-05-27 | — | — | WO | disclosed |
| US-7629424-B2 | Metal-containing compositions and method of making same | PRYOG, LLC (US) | 2009-12-08 | — | — | US | disclosed |
| US-20080015278-A1 | Metal-Containing Compositions and Method of Making Same | PRYOG, LLC | 2008-01-17 | — | — | US | disclosed |
| WO-2007070092-A2 | METAL-CONTAINING COMPOSITIONS AND METHOD OF MAKING SAME | PRYOG, LLC (US) | 2007-06-21 | — | — | WO | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20160259244-A1 | NEGATIVE RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN AND COMPLEX | ACTN4, CHD4, H1-4 | KDM4E 1729/4885LMNA 1515/4885EPHX2 4425/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.