Predicted protein targets (top 10)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TSHR | P16473 | 6/20 | 0.36 |
| ▸ | HPGD | P15428 | 1/20 | 0.36 |
| ▸ | ALDH1A1 | P00352 | 4/20 | 0.35 |
| ▸ | TP53 | P04637 | 3/20 | 0.35 |
| ▸ | HIF1A | Q16665 | 3/20 | 0.35 |
| ▸ | CYP3A4 | P08684 | 2/20 | 0.35 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.35 |
| ▸ | THRB | P10828 | 2/20 | 0.34 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.33 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.33 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL18924581 | 0.83 | THRB (0.38) | TSHRHPGDALDH1A1TP53HIF1A | |
| SCHEMBL18051631 | 0.76 | TSHR (0.54) | TSHRHPGDALDH1A1TP53HIF1A | |
| SCHEMBL28064194 | 0.76 | TSHR (0.40) | TSHRHPGDALDH1A1TP53HIF1A | |
| SCHEMBL23250800 | 0.72 | THRB (0.44) | TSHRALDH1A1THRB | |
| SCHEMBL335609 | 0.72 | THRB (0.49) | TSHRHPGDALDH1A1TP53HIF1A | |
| SCHEMBL1656531 | 0.71 | TSHR (0.57) | TSHRHPGDALDH1A1TP53HIF1A | |
| SCHEMBL28730584 | 0.70 | TSHR (0.57) | TSHRHPGDALDH1A1TP53HIF1A | |
| SCHEMBL2741580 | 0.70 | ALDH1A1 (0.46) | TSHRHPGDALDH1A1TP53HIF1A | |
| SCHEMBL18516817 | 0.70 | ALDH1A1 (0.46) | TSHRHPGDALDH1A1TP53HIF1A | |
| SCHEMBL9055413 | 0.69 | TSHR (0.72) | TSHRHPGDALDH1A1TP53HIF1A |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9726974-B2 | Resin, photoresist composition, and method for producing photoresist pattern | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2017-08-08 | — | — | US | disclosed |