⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL6672450 | 0.84 | — | — | |
| SCHEMBL15275 | 0.79 | LMNA (0.32) | — | |
| SCHEMBL2170439 | 0.78 | LMNA (0.31) | — | |
| SCHEMBL37107 | 0.76 | CES2 (0.32) | — | |
| SCHEMBL35806 | 0.76 | — | — | |
| SCHEMBL5947836 | 0.76 | LMNA (0.30) | — | |
| Boric Acid SCHEMBL23358688 | 0.75 | — | — | |
| SCHEMBL4445749 | 0.75 | — | — | |
| SCHEMBL1068964 | 0.75 | CES2 (0.35) | — | |
| SCHEMBL1806378 | 0.75 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 203 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8344238-B2 | Self-cleaning protective coatings for use with photovoltaic cells | SOLYNDRA LLC (US) | 2013-01-01 | — | — | US | claimed |
| US-20110000539-A1 | Self-cleaning protective coatings for use with photovoltaic cells | SOLYNDRA, INC. (US) | 2011-01-06 | — | — | US | claimed |
| US-20100326495-A1 | Self-cleaning protective coatings for use with photovoltaic cells | SOLYNDRA, INC. (US) | 2010-12-30 | — | — | US | claimed |
| US-20070017567-A1 | Self-cleaning protective coatings for use with photovoltaic cells | BARNES, CHRISTOPHER | 2007-01-25 | — | — | US | claimed |
| WO-2007012026-A1 | SELF-CLEANING COATINGS | SOLYNDRA, INC. (US) | 2007-01-25 | — | — | WO | claimed |
| EP-2839968-B1 | ORIGINAL PLATE FOR LITHOGRAPHIC PRINTING PLATE, AND METHOD FOR PRINTING SAME | FUJIFILM CORP (JP) | 2018-07-11 | — | — | EP | disclosed |
| EP-1356929-B2 | Method of preparation of lithographic printing plates | FUJIFILM CORP (JP) | 2016-11-16 | — | — | EP | disclosed |
| EP-2839968-A1 | ORIGINAL PLATE FOR LITHOGRAPHIC PRINTING PLATE, AND METHOD FOR PRINTING SAME | FUJIFILM Corporation (JP) | 2015-02-25 | — | — | EP | disclosed |
| US-20150000544-A1 | LITHOGRAPHIC PRINTING PLATE PRECURSOR AND PRINTING METHOD THEREOF | FUJIFILM CORPORATION (JP) | 2015-01-01 | — | — | US | disclosed |
| US-20140322510-A1 | GAS BARRIER FILM | Konica Minolta, Inc. (JP) | 2014-10-30 | — | — | US | disclosed |
| EP-2792482-A1 | GAS BARRIER FILM | Konica Minolta, Inc. (JP) | 2014-10-22 | — | — | EP | disclosed |
| US-8815130-B2 | Method for producing a lens | DAI NIPPON PRINTING CO., LTD. (JP) | 2014-08-26 | — | — | US | disclosed |
| EP-1008873-A1 | Color filter and process for producing the same | DAI NIPPON PRINTING CO., LTD. (JP) | 2000-06-14 | — | — | EP | disclosed |
| US-6013372-A | SELF-CLEANING, WEAR RESISTANT COATING | TOTO, LTD. (JP) | 2000-01-11 | — | — | US | disclosed |
| EP-0941839-A2 | Radiant ray-sensitive lithographic printing plate precursor | FUJI PHOTO FILM CO., LTD. (JP) | 1999-09-15 | — | — | EP | disclosed |
| EP-0932081-A1 | PATTERN FORMING BODY, PATTERN FORMING METHOD, AND THEIR APPLICATIONS | DAI NIPPON PRINTING CO., LTD. (JP) | 1999-07-28 | — | — | EP | disclosed |
| EP-0903389-A1 | ANTIFOULING MEMBER AND ANTIFOULING COATING COMPOSITION | TOTO LTD. (JP) | 1999-03-24 | — | — | EP | disclosed |
| US-5414065-A | Polymer comprising fluoroalkyl group, a method of preparation thereof, a surface active agent, a surface treatment agent and a coating composition | NOF CORPORATION (JP) | 1995-05-09 | — | — | US | disclosed |
| US-5324803-A | End groups derived from fluoroalkanoyl peroxide; oil and water repellent | NOF CORPORATION (JP) | 1994-06-28 | — | — | US | disclosed |
| EP-0537669-A1 | A polymer comprising fluoroalkyl group, a method of preparation thereof, a surface active agent, a surface treatment agent and a coating composition | NOF CORPORATION (JP) | 1993-04-21 | — | — | EP | disclosed |