Predicted protein targets (top 8)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | PTGS2 | P35354 | 4/20 | 0.48 |
| ▸ | EP300 | Q09472 | 1/20 | 0.47 |
| ▸ | EPHX2 | P34913 | 1/20 | 0.46 |
| ▸ | CYSLTR2 | Q9NS75 | 1/20 | 0.43 |
| ▸ | CYSLTR1 | Q9Y271 | 1/20 | 0.43 |
| ▸ | IDO1 | P14902 | 3/20 | 0.42 |
| ▸ | SOAT1 | P35610 | 8/20 | 0.39 |
| ▸ | THRB | P10828 | 1/20 | 0.39 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL9400369 | 1.00 | PTGS2 (0.48) | PTGS2EP300EPHX2CYSLTR2CYSLTR1 | |
| SCHEMBL16664180 | 0.98 | PTGS2 (0.47) | PTGS2EP300EPHX2CYSLTR2CYSLTR1 | |
| SCHEMBL647859 | 0.93 | PTGS2 (0.46) | PTGS2EP300EPHX2IDO1 | |
| SCHEMBL25738394 | 0.82 | IDO1 (0.43) | PTGS2EP300IDO1 | |
| SCHEMBL5313693 | 0.80 | EPHX2 (0.64) | PTGS2EPHX2CYSLTR2CYSLTR1SOAT1 | |
| SCHEMBL19066580 | 0.80 | EPHX2 (0.64) | PTGS2EPHX2CYSLTR2CYSLTR1SOAT1 | |
| SCHEMBL22444760 | 0.80 | EPHX2 (0.64) | PTGS2EPHX2CYSLTR2CYSLTR1SOAT1 | |
| SCHEMBL9447706 | 0.80 | EPHX2 (0.64) | PTGS2EPHX2CYSLTR2CYSLTR1SOAT1 | |
| SCHEMBL1057913 | 0.79 | IDO1 (0.52) | EP300IDO1 | |
| SCHEMBL25934912 | 0.79 | IDO1 (0.43) | EP300IDO1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20230152698-A1 | POSITIVE RESIST COMPOSITION AND PATTERN FORMING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-05-18 | — | — | US | disclosed |
| EP-3205640-A1 | MONOMER, POLYMER, RESIST COMPOSITION, AND PATTERNING PROCESS | Shin-Etsu Chemical Co., Ltd. (JP) | 2017-08-16 | — | — | EP | disclosed |