Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | PTGS2 | P35354 | 6/20 | 0.46 |
| ▸ | IDO1 | P14902 | 6/20 | 0.45 |
| ▸ | EP300 | Q09472 | 3/20 | 0.42 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.42 |
| ▸ | MAPT | P10636 | 2/20 | 0.42 |
| ▸ | NPSR1 | Q6W5P4 | 2/20 | 0.42 |
| ▸ | TLR8 | Q9NR97 | 1/20 | 0.41 |
| ▸ | EPHX2 | P34913 | 1/20 | 0.39 |
| ▸ | LMNA | P02545 | 1/20 | 0.39 |
| ▸ | HTT | P42858 | 1/20 | 0.39 |
| ▸ | KAT2B | Q92831 | 2/20 | 0.37 |
| ▸ | KAT8 | Q9H7Z6 | 2/20 | 0.37 |
| ▸ | HDAC3 | O15379 | 1/20 | 0.37 |
| ▸ | NCOR2 | Q9Y618 | 1/20 | 0.37 |
| ▸ | MEN1 | O00255 | 1/20 | 0.37 |
| ▸ | NPC1 | O15118 | 1/20 | 0.37 |
| ▸ | CNR2 | P34972 | 1/20 | 0.37 |
| ▸ | RAB9A | P51151 | 1/20 | 0.37 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.37 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.37 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL16664180 | 0.95 | PTGS2 (0.47) | PTGS2IDO1EP300ALDH1A1MAPT | |
| SCHEMBL19245741 | 0.93 | PTGS2 (0.48) | PTGS2IDO1EP300EPHX2 | |
| SCHEMBL9400369 | 0.93 | PTGS2 (0.48) | PTGS2IDO1EP300EPHX2 | |
| SCHEMBL25738394 | 0.85 | IDO1 (0.43) | PTGS2IDO1EP300KAT2BKAT8 | |
| SCHEMBL1057913 | 0.82 | IDO1 (0.52) | IDO1EP300KAT2BKAT8HDAC3 | |
| SCHEMBL25934912 | 0.81 | IDO1 (0.43) | IDO1EP300KAT2BKAT8HDAC3 | |
| SCHEMBL348041 | 0.81 | PTGS2 (0.50) | PTGS2ALDH1A1MAPTNPSR1TLR8 | |
| SCHEMBL19245462 | 0.81 | PTGS2 (0.43) | PTGS2IDO1EP300MAPTNPSR1 | |
| SCHEMBL16519472 | 0.78 | PTGS2 (0.51) | PTGS2ALDH1A1MAPTNPSR1TLR8 | |
| SCHEMBL9323113 | 0.78 | EPHX2 (0.56) | PTGS2ALDH1A1MAPTNPSR1TLR8 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 26 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20160349619-A1 | PATTERN FORMING METHOD, RESIST COMPOSITION FOR MULTIPLE DEVELOPMENT USED IN THE PATTERN FORMING METHOD, DEVELOPER FOR NEGATIVE DEVELOPMENT USED IN THE PATTERN FORMING METHOD, AND RINSING SOLUTION FOR NEGATIVE DEVELOPMENT USED IN THE PATTERN FORMING METHOD | FUJIFILM CORPORATION (JP) | 2016-12-01 | — | — | US | disclosed |
| EP-1580598-B1 | Positive resist composition for immersion exposure and pattern-forming method using the same | FUJIFILM CORP (JP) | 2016-10-12 | — | — | EP | disclosed |
| US-9405197-B2 | Pattern forming method, method for manufacturing electronic device, and electronic device | FUJIFILM CORPORATION (JP) | 2016-08-02 | — | — | US | disclosed |
| US-9291904-B2 | Pattern forming method, resist composition for multiple development used in the pattern forming method, developer for negative development used in the pattern forming method, and rinsing solution for negative development used in the pattern forming method | FUJIFILM CORPORATION (JP) | 2016-03-22 | — | — | US | disclosed |
| US-9250530-B2 | — | — | 2016-02-02 | — | — | US | disclosed |
| EP-1536285-B1 | Photosensitive composition, compound for use in the photosensitive composition, and pattern forming method using the photosensitive composition | FUJIFILM CORP (JP) | 2016-01-06 | — | — | EP | disclosed |
| US-20150160559-A1 | PATTERN FORMING METHOD, METHOD FOR MANUFACTURING ELECTRONIC DEVICE, AND ELECTRONIC DEVICE | FUJIFILM CORPORATION (JP) | 2015-06-11 | — | — | US | disclosed |
| US-9023576-B2 | Positive resist composition for immersion exposure and pattern-forming method using the same | FUJIFILM CORPORATION (JP) | 2015-05-05 | — | — | US | disclosed |
| US-20150079522-A1 | PATTERN FORMING METHOD, RESIST COMPOSITION FOR MULTIPLE DEVELOPMENT USED IN THE PATTERN FORMING METHOD, DEVELOPER FOR NEGATIVE DEVELOPMENT USED IN THE PATTERN FORMING METHOD, AND RINSING SOLUTION FOR NEGATIVE DEVELOPMENT USED IN THE PATTERN FORMING METHOD | FUJIFILM CORPORATION (JP) | 2015-03-19 | — | — | US | disclosed |
| US-8951718-B2 | Pattern forming method, resist composition for multiple development used in the pattern forming method, developer for negative development used in the pattern forming method, and rinsing solution for negative development used in the pattern forming method | FUJIFILM CORPORATION (JP) | 2015-02-10 | — | — | US | disclosed |
| US-8119778-B2 | Reversibly thermochromic compositions | BASF SE (DE) | 2012-02-21 | — | — | US | disclosed |
| EP-2032370-B1 | REVERSIBLY THERMOCHROMIC COMPOSITIONS | BASF SE (DE) | 2010-11-10 | — | — | EP | disclosed |
| US-20100234494-A1 | Reversibly thermochromic compositions | CIBA CORPORATION | 2010-09-16 | — | — | US | disclosed |
| EP-2032370-A2 | REVERSIBLY THERMOCHROMIC COMPOSITIONS | Ciba Holding Inc. (CH) | 2009-03-11 | — | — | EP | disclosed |
| WO-2007147843-A2 | REVERSIBLY THERMOCHROMIC COMPOSITIONS | CIBA HOLDING INC. (CH) | 2007-12-27 | — | — | WO | disclosed |
| US-7273690-B2 | Positive resist composition for immersion exposure and method of pattern formation with the same | FUJIFILM CORPORATION (JP) | 2007-09-25 | — | — | US | disclosed |
| US-20070218405-A1 | Positive resist composition and pattern formation method using the positive resist composition | FUJIFILM CORPORATION (JP) | 2007-09-20 | — | — | US | disclosed |
| EP-1835343-A1 | Positive resist composition and pattern formation method using the positive resist composition | FUJIFILM Corporation (JP) | 2007-09-19 | — | — | EP | disclosed |
| EP-1835340-A1 | Positive resist composition and pattern formation method using the positive resist composition | FUJIFILM Corporation (JP) | 2007-09-19 | — | — | EP | disclosed |
| US-20070105045-A1 | Positive resist composition and pattern formation method using the positive resist composition | FUJIFILM CORPORATION | 2007-05-10 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20100234494-A1 | Reversibly thermochromic compositions | CRY1, REL, CRY2 | PTGS2 1468/4885IDO1 936/4885EP300 1108/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.