SCHEMBL16664180

SCHEMBL16664180

CCCCCSc1ccc(O)c2ccccc12

nearest known ligand 0.47

Predicted protein targets (top 12)

geneUniProtsupporting neighboursconfidence
▸ PTGS2 P35354 4/20 0.47
▸ EP300 Q09472 1/20 0.44
▸ EPHX2 P34913 1/20 0.44
▸ IDO1 P14902 4/20 0.43
▸ CYSLTR2 Q9NS75 1/20 0.41
▸ CYSLTR1 Q9Y271 1/20 0.41
▸ P4HB P07237 1/20 0.39
▸ SOAT1 P35610 5/20 0.38
▸ ALDH1A1 P00352 1/20 0.38
▸ MAPT P10636 1/20 0.38
▸ NPSR1 Q6W5P4 1/20 0.38
▸ TLR8 Q9NR97 1/20 0.37

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL9400369 0.98 PTGS2 (0.48) PTGS2EP300EPHX2IDO1CYSLTR2
SCHEMBL19245741 0.98 PTGS2 (0.48) PTGS2EP300EPHX2IDO1CYSLTR2
SCHEMBL647859 0.95 PTGS2 (0.46) PTGS2EP300EPHX2IDO1ALDH1A1
SCHEMBL25738394 0.83 IDO1 (0.43) PTGS2EP300IDO1
SCHEMBL1057913 0.80 IDO1 (0.52) EP300IDO1
SCHEMBL25934912 0.80 IDO1 (0.43) EP300IDO1
SCHEMBL19245462 0.80 PTGS2 (0.43) PTGS2EP300IDO1MAPTNPSR1
SCHEMBL2070118 0.79 EPHX2 (0.62) PTGS2EPHX2CYSLTR2CYSLTR1P4HB
SCHEMBL28687732 0.78 PTGS2 (0.44) PTGS2EPHX2CYSLTR2CYSLTR1ALDH1A1
SCHEMBL15521629 0.78 PTGS2 (0.48) PTGS2EP300IDO1SOAT1MAPT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20170205709-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2017-07-20 — — US disclosed
EP-3168207-A1 MONOMER, POLYMER, RESIST COMPOSITION, AND PATTERNING PROCESS Shin-Etsu Chemical Co., Ltd. (JP) 2017-05-17 — — EP disclosed
US-20170131635-A1 MONOMER, POLYMER, RESIST COMPOSITION, AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2017-05-11 — — US disclosed
EP-3032332-B1 SHRINK MATERIAL AND PATTERN FORMING PROCESS SHINETSU CHEMICAL CO (JP) 2017-04-05 — — EP disclosed
EP-2993520-B1 RESIST COMPOSITION AND PATTERNING PROCESS SHINETSU CHEMICAL CO (JP) 2017-03-08 — — EP disclosed
US-20150111157-A1 METHOD OF FORMING PATTERN AND ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION FOR USE IN THE METHOD FUJIFILM CORPORATION (JP) 2015-04-23 — — US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20170131635-A1 MONOMER, POLYMER, RESIST COMPOSITION, AND PATTERNING PROCESS H1-2, H1-0, H1-4 PTGS2 4429/4885EP300 2636/4885EPHX2 647/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.

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