SCHEMBL19253941

SCHEMBL19253941

C=C(C)C(=O)OCCN(C)C.C=C(C)C(=O)Oc1ccc(O)cc1

nearest known ligand 0.44

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ELANE P08246 1/20 0.44
POLB P06746 1/20 0.43
APEX1 P27695 1/20 0.43
HTT P42858 1/20 0.43
TDP1 Q9NUW8 1/20 0.43
KMT2A Q03164 1/20 0.42
ATM Q13315 1/20 0.42
BCHE P06276 2/20 0.41
CHRM2 P08172 1/20 0.41
ALDH1A1 P00352 2/20 0.41
CYP1A2 P05177 1/20 0.41
CYP3A4 P08684 1/20 0.41
CYP2C19 P33261 1/20 0.41
GAA P10253 1/20 0.41
MAPT P10636 1/20 0.41
SMN1; SMN2 Q16637 1/20 0.41
ESR1 P03372 4/20 0.40
BLM P54132 1/20 0.40
PMP22 Q01453 1/20 0.40
ESRRB O95718 3/20 0.39

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL72362 0.82 ELANE (0.61) ELANETDP1KMT2AATMALDH1A1
SCHEMBL14984 0.80 CHRM2 (0.54) POLBAPEX1HTTTDP1BCHE
SCHEMBL28671752 0.80 CHRM2 (0.54) POLBAPEX1HTTTDP1BCHE
SCHEMBL19253943 0.79 ELANE (0.44) ELANEPOLBAPEX1HTTTDP1
Benzene SCHEMBL28182923 0.78 THRB (0.48) POLBAPEX1HTTTDP1BCHE
Bromide SCHEMBL1255341 0.78 CHRM2 (0.52) POLBAPEX1HTTTDP1BCHE
SCHEMBL11650326 0.78 CHRM2 (0.52) POLBAPEX1HTTTDP1BCHE
Methyl Alcohol SCHEMBL21326731 0.78 CHRM2 (0.52) POLBAPEX1HTTTDP1BCHE
Ammonia Solution, Strong SCHEMBL8139148 0.78 CHRM2 (0.52) POLBAPEX1HTTTDP1BCHE
Hydrochloric Acid SCHEMBL129149 0.78 CHRM2 (0.52) POLBAPEX1HTTTDP1BCHE

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-10012902-B2 Positive resist composition and pattern forming process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2018-07-03 US disclosed
US-20170242339-A1 POSITIVE RESIST COMPOSITION AND PATTERN FORMING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2017-08-24 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-10012902-B2 Positive resist composition and pattern forming process EWSR1, SRPRA, SRPRB ELANE 2338/4885POLB 182/4885APEX1 1340/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.