SCHEMBL19253943

SCHEMBL19253943

C=C(C)C(=O)OCCN(C)C.C=C(CO)C(=O)Oc1ccccc1

nearest known ligand 0.44

Predicted protein targets (top 15)

geneUniProtsupporting neighboursconfidence
ELANE P08246 1/20 0.44
ESR1 P03372 2/20 0.40
POLB P06746 1/20 0.40
APEX1 P27695 1/20 0.40
HTT P42858 1/20 0.40
TDP1 Q9NUW8 1/20 0.40
CHRM1 P11229 1/20 0.40
LMNA P02545 2/20 0.39
TSHR P16473 1/20 0.39
CYP2C19 P33261 1/20 0.39
ESRRB O95718 3/20 0.38
KDM4E B2RXH2 4/20 0.38
ALDH1A1 P00352 3/20 0.38
SMN1; SMN2 Q16637 1/20 0.38
LTA4H P09960 1/20 0.38

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Methacrylic Acid SCHEMBL8512989 0.81 ELANE (0.51) ELANETDP1ALDH1A1
Benzene SCHEMBL28182923 0.81 THRB (0.48) POLBAPEX1HTTTDP1CHRM1
SCHEMBL824141 0.79 ELANE (0.46) ELANETDP1KDM4EALDH1A1
SCHEMBL19253941 0.79 ELANE (0.44) ELANEESR1POLBAPEX1HTT
Benzil SCHEMBL10781939 0.79 EGFR (0.50) ELANEESR1POLBAPEX1HTT
Benzoic Acid SCHEMBL31179841 0.79 POLB (0.55) ELANEESR1POLBAPEX1HTT
SCHEMBL29089241 0.78 ELANE (0.56) ELANEPOLBAPEX1HTTTDP1
SCHEMBL6037217 0.78 ALDH1A1 (0.50) POLBAPEX1HTTTDP1CHRM1
SCHEMBL8084626 0.78 CHRM1 (0.44) POLBAPEX1HTTTDP1CHRM1
(Chloromethyl)Benzene SCHEMBL128111 0.76 CHRM1 (0.49) POLBAPEX1HTTTDP1CHRM1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-10012902-B2 Positive resist composition and pattern forming process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2018-07-03 US disclosed
US-20170242339-A1 POSITIVE RESIST COMPOSITION AND PATTERN FORMING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2017-08-24 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-10012902-B2 Positive resist composition and pattern forming process EWSR1, SRPRA, SRPRB ELANE 2338/4885ESR1 510/4885POLB 182/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.