Nitrous Acid

Nitrous Acid

SCHEMBL19282181

O=NO.O=[N+]([O-])Nc1cccc2ccccc12

nearest known ligand 0.47

Full drug profile on Sugi Atlas →

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALOX5 P09917 1/20 0.47
KDM4E B2RXH2 4/20 0.46
GAA P10253 1/20 0.46
MAPT P10636 6/20 0.45
ALDH1A1 P00352 5/20 0.45
MEN1 O00255 4/20 0.45
KMT2A Q03164 4/20 0.45
HPGD P15428 3/20 0.45
LMNA P02545 1/20 0.45
SMN1; SMN2 Q16637 1/20 0.45
CYP3A4 P08684 2/20 0.42
NPC1 O15118 1/20 0.42
CYP1A2 P05177 1/20 0.42
CYP2D6 P10635 1/20 0.42
CYP2C9 P11712 1/20 0.42
CYP2C19 P33261 1/20 0.42
RAB9A P51151 1/20 0.42
PTPN1 P18031 1/20 0.42
RORC P51449 1/20 0.42
CA12 O43570 2/20 0.42

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Nitrous Acid SCHEMBL6927479 1.00 ALOX5 (0.47) ALOX5KDM4EGAAMAPTALDH1A1
SCHEMBL1135592 0.91 ALDH1A1 (0.52) ALOX5KDM4EGAAMAPTALDH1A1
SCHEMBL9308263 0.75 TRPV1 (0.43) ALOX5KDM4EGAAMAPTALDH1A1
Nitrous Acid SCHEMBL27800188 0.72 ALDH1A1 (0.79) KDM4EMAPTALDH1A1MEN1KMT2A
Nitrous Acid SCHEMBL7645559 0.72 ALDH1A1 (0.79) KDM4EMAPTALDH1A1MEN1KMT2A
Nitric Acid SCHEMBL27917190 0.72 KDM4E (0.53) ALOX5KDM4EGAAMAPTALDH1A1
SCHEMBL28345980 0.71 KMT2A (0.49) ALOX5KDM4EGAAMAPTALDH1A1
SCHEMBL8961639 0.71 ALDH1A1 (0.63) KDM4EMAPTALDH1A1MEN1KMT2A
SCHEMBL10825143 0.70 HSP90AA1 (0.42) ALOX5KDM4EMAPTALDH1A1MEN1
Nitrous Acid SCHEMBL27611591 0.69 CA12 (0.81) KDM4EGAAMAPTALDH1A1MEN1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 8 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20220037149-A1 SUBSTRATE TREATMENT METHOD AND SUBSTRATE TREATMENT APPARATUS SHIBAURA MECHATRONICS CORPORATION (JP) 2022-02-03 US claimed
US-20170250331-A1 LIGHT EMITTING DEVICE PACKAGE AND LIGHT EMITTING MODULE COMPRISING SAME LG INNOTEK CO., LTD. (KR) 2017-08-31 US claimed
US-12354869-B2 Substrate treatment method and substrate treatment apparatus SHIBAURA MECHATRONICS CORPORATION (JP) 2025-07-08 US disclosed
CN-114068353-B Substrate processing method and substrate processing apparatus 芝浦机械电子株式会社 2025-06-24 CN disclosed
CN-114479650-A Corrosion-resistant material, terminal-equipped electric wire, and wire harness 矢崎总业株式会社 2022-05-13 CN disclosed
US-20220037149-A1 SUBSTRATE TREATMENT METHOD AND SUBSTRATE TREATMENT APPARATUS SHIBAURA MECHATRONICS CORPORATION (JP) 2022-02-03 US disclosed
CN-110431255-B Corrosion-resistant structure 日东电工株式会社 2021-07-16 CN disclosed
US-20170250331-A1 LIGHT EMITTING DEVICE PACKAGE AND LIGHT EMITTING MODULE COMPRISING SAME LG INNOTEK CO., LTD. (KR) 2017-08-31 US disclosed