SCHEMBL1935481

SCHEMBL1935481

FC(F)(F)CC1OCCO1

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1936011 0.89
SCHEMBL10259975 0.89
SCHEMBL13744044 0.78
SCHEMBL13744573 0.74
SCHEMBL13744347 0.73
SCHEMBL13744342 0.72
SCHEMBL3648086 0.71
SCHEMBL12889918 0.71
SCHEMBL2625531 0.71 THRA (0.30)
SCHEMBL16040519 0.69 FAAH (0.32)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 217 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2025245079-A1 ORGANIC EXTRACTING SOLVENTS FOR SUCCESSFULLY RECYCLING LIPF6 FROM WASTE SHREDDED BATTERY MATERIAL ORBIA FLUOR & ENERGY MATERIALS USA INC. (US) 2025-11-27 WO claimed
US-20110245249-A1 Heterocyclically Substituted Anilinopyrimidines BAYER CROPSCIENCE AG (DE) 2011-10-06 US claimed
EP-2331533-A1 HETEROCYCLICALLY SUBSTITUTED ANILINOPYRIMIDINES AS FUNGICIDES Bayer CropScience AG (DE) 2011-06-15 EP claimed
WO-2010025850-A1 HETEROCYCLICALLY SUBSTITUTED ANILINOPYRIMIDINES AS FUNGICIDES BAYER CROPSCIENCE AG (DE) 2010-03-11 WO claimed
US-12620622-B2 Compound including sulfur-containing heterocyclic cation and bis(oxolato)borate anion, electrolytic solution and electrochemical device including the same DAIKIN INDUSTRIES, LTD. (JP) 2026-05-05 US disclosed
US-12614758-B2 Composition MEXICHEM FLUOR S.A. DE. C.V. (MX) 2026-04-28 US disclosed
EP-4443589-B1 ELECTROLYTE, AND ELECTROCHEMICAL DEVICE AND SECONDARY BATTERY WHICH USE SAME DAIKIN IND LTD (JP) 2026-04-22 EP disclosed
EP-4706123-A2 HALOGENATED ETHER-CONTAINING ELECTROLYTES Feon Energy, Inc. (US) 2026-03-11 EP disclosed
WO-2025245079-A1 ORGANIC EXTRACTING SOLVENTS FOR SUCCESSFULLY RECYCLING LIPF6 FROM WASTE SHREDDED BATTERY MATERIAL ORBIA FLUOR & ENERGY MATERIALS USA INC. (US) 2025-11-27 WO disclosed
US-20250349897-A1 ELECTROLYTIC SOLUTION, AND ELECTROCHEMICAL DEVICE AND SECONDARY BATTERY USING SAME DAIKIN INDUSTRIES, LTD. (JP) 2025-11-13 US disclosed
US-20250343268-A1 ELECTROLYTE, AND ELECTROCHEMICAL DEVICE AND SECONDARY BATTERY WHICH USE SAME DAIKIN INDUSTRIES, LTD. (JP) 2025-11-06 US disclosed
US-20250260063-A1 ELECTROLYTIC SOLUTION, ELECTROCHEMICAL DEVICE, SECONDARY BATTERY, AND LITHIUM-ION SECONDARY BATTERY DAIKIN INDUSTRIES, LTD. (JP) 2025-08-14 US disclosed
US-20110245249-A1 Heterocyclically Substituted Anilinopyrimidines BAYER CROPSCIENCE AG (DE) 2011-10-06 US disclosed
EP-2331533-A1 HETEROCYCLICALLY SUBSTITUTED ANILINOPYRIMIDINES AS FUNGICIDES Bayer CropScience AG (DE) 2011-06-15 EP disclosed
WO-2010025850-A1 HETEROCYCLICALLY SUBSTITUTED ANILINOPYRIMIDINES AS FUNGICIDES BAYER CROPSCIENCE AG (DE) 2010-03-11 WO disclosed
US-7569323-B2 Resist protective coating material and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2009-08-04 US disclosed
US-20070105044-A1 Fluorine-containing polymer coating composition, method for forming fluorine-containing polymer film using coating composition, and method for forming photoresist or lithographic pattern CENTRAL GLASS COMPANY, LIMITED (JP) 2007-05-10 US disclosed
US-20070105044-A1 Fluorine-containing polymer coating composition, method for forming fluorine-containing polymer film using coating composition, and method for forming photoresist or lithographic pattern CENTRAL GLASS COMPANY, LIMITED (JP) 2007-05-10 US disclosed
US-20070105044-A1 Fluorine-containing polymer coating composition, method for forming fluorine-containing polymer film using coating composition, and method for forming photoresist or lithographic pattern CENTRAL GLASS COMPANY, LIMITED (JP) 2007-05-10 US disclosed
US-20070026341-A1 Resist protective coating material and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2007-02-01 US disclosed