SCHEMBL19359671

SCHEMBL19359671

CC(C)C(C)(C)c1ccc2ccc(O)cc2c1

nearest known ligand 0.42

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ESR1 P03372 9/20 0.42
ESR2 Q92731 9/20 0.42
CYP1A2 P05177 1/20 0.42
CYP3A4 P08684 5/20 0.39
HSD17B10 Q99714 4/20 0.39
TSHR P16473 2/20 0.39
LMNA P02545 2/20 0.39
TYR P14679 2/20 0.39
SLC6A2 P23975 2/20 0.39
SLC6A4 P31645 2/20 0.39
SLC6A3 Q01959 2/20 0.39
AR P10275 1/20 0.39
HPGD P15428 1/20 0.39
HTR6 P50406 1/20 0.39
ESRRG P62508 1/20 0.39
CYP2C9 P11712 2/20 0.36
ALOX15 P16050 2/20 0.35
HIF1A Q16665 1/20 0.35
TDP1 Q9NUW8 1/20 0.35
ALDH1A1 P00352 2/20 0.34

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL18161365 0.80 LMNA (0.56) ESR1ESR2CYP1A2CYP3A4HSD17B10
SCHEMBL12601253 0.79 ESR1 (0.47) ESR1ESR2CYP1A2CYP3A4HSD17B10
SCHEMBL1773215 0.78 ESR1 (0.56) ESR1ESR2CYP3A4HSD17B10TSHR
SCHEMBL11377041 0.77 CYP3A4 (0.42) CYP1A2CYP3A4HSD17B10SLC6A2SLC6A4
SCHEMBL15759689 0.75 ALDH1A1 (0.44) ESR1ESR2CYP3A4HSD17B10TSHR
SCHEMBL10224683 0.74 ESR1 (0.44) ESR1ESR2CYP1A2CYP3A4HSD17B10
SCHEMBL2048078 0.74 LMNA (0.58) ESR1ESR2CYP1A2CYP3A4HSD17B10
SCHEMBL11275540 0.73 TAAR1 (0.42) ESR1ESR2CYP1A2CYP3A4HSD17B10
SCHEMBL30873741 0.72 KIF11 (0.50) ESR1ESR2CYP1A2CYP3A4HSD17B10
SCHEMBL12601245 0.72 CYP1A2 (0.48) ESR1ESR2CYP1A2CYP3A4HSD17B10

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9766541-B2 Positive-type resist composition, method for forming resist pattern, photo-reactive quencher, and polymeric compound TOKYO OHKA KOGYO CO., LTD. (JP) 2017-09-19 US disclosed