SCHEMBL1936734

SCHEMBL1936734

CC(Cl)=CCC(=O)O

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1936731 1.00
SCHEMBL2354631 0.77
SCHEMBL2354636 0.77
SCHEMBL822374 0.77
SCHEMBL11024924 0.77 ALDH1A1 (0.47)
SCHEMBL8469715 0.77
SCHEMBL11095819 0.74
SCHEMBL10966029 0.74
SCHEMBL10966032 0.74
SCHEMBL275071 0.72 ALDH1A1 (0.43)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 21 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20210289794-A1 COMPOSITIONS AND RELATED METHODS FOR AGRICULTURE FLAGSHIP PIONEERING INNOVATIONS V, INC. 2021-09-23 US disclosed
EP-2331649-B1 METHODS AND COMPOSITIONS FOR POLISHING SILICON-CONTAINING SUBSTRATES CABOT MICROELECTRONICS CORP (US) 2018-06-13 EP disclosed
US-8597540-B2 Compositions for polishing silicon-containing substrates CABOT MICROELECTRONICS CORPORATION (US) 2013-12-03 US disclosed
US-8486169-B2 Method of polishing a silicon-containing dielectric CABOT MICROELECTRONICS CORPORATION (US) 2013-07-16 US disclosed
US-20120280170-A1 COMPOSITIONS FOR POLISHING SILICON-CONTAINING SUBSTRATES CABOT MICROELECTRONICS CORPORATION 2012-11-08 US disclosed
US-8247327-B2 Methods and compositions for polishing silicon-containing substrates CABOT MICROELECTRONICS CORPORATION (US) 2012-08-21 US disclosed
EP-2331649-A2 METHODS AND COMPOSITIONS FOR POLISHING SILICON-CONTAINING SUBSTRATES Cabot Microelectronics Corporation (US) 2011-06-15 EP disclosed
WO-2010014180-A2 METHODS AND COMPOSITIONS FOR POLISHING SILICON-CONTAINING SUBSTRATES CABOT MICROELECTRONICS CORPORATION (US) 2010-02-04 WO disclosed
US-20100029181-A1 Methods and compositions for polishing silicon-containing substrates CMC MATERIALS LLC 2010-02-04 US disclosed
US-20090029633-A1 METHOD OF POLISHING A SILICON-CONTAINING DIELECTRIC CABOT MICROELECTRONICS CORPORATION (US) 2009-01-29 US disclosed
US-20060196848-A1 Readily deinkable toners MORGAN STANLEY SENIOR FUNDING, INC., AS COLLATERAL AGENT 2006-09-07 US disclosed
US-20060144824-A1 Method of polishing a silicon-containing dielectric CABOT MICROELECTRONICS CORPORATION (US) 2006-07-06 US disclosed
US-7071105-B2 Method of polishing a silicon-containing dielectric CABOT MICROELECTRONICS CORPORATION (US) 2006-07-04 US disclosed
EP-1601735-A1 METHOD OF POLISHING A SILICON-CONTAINING DIELECTRIC Cabot Microelectronics Corporation (US) 2005-12-07 EP disclosed
WO-2004069947-A1 METHOD OF POLISHING A SILICON-CONTAINING DIELECTRIC CABOT MICROELECTRONICS CORPORATION (US) 2004-08-19 WO disclosed
US-20040152309-A1 Method of polishing a silicon-containing dielectric CABOT MICROELECTRONICS CORPORATION 2004-08-05 US disclosed
CN-1037177-C Noel 2-substituted alkyl-3-carboxy carbapenems as antibiotics and a method of producing them AMERICAN CYANAMID CO (US) 1998-01-28 CN disclosed
CN-1034332-C Process for preparing 2-substituted alkyl-3-carboxy carbapenems as antibiotics AMERICAN CYANAMID CO (US) 1997-03-26 CN disclosed
CN-1034329-C Novel 2-substituted alkyl-3-carboxy carbapenems as antibiotics and a method of producing them AMERICAN CYANAMID CO (US) 1997-03-26 CN disclosed
EP-0104863-A2 Light-sensitive planographic printing plate FUJI PHOTO FILM CO., LTD. (JP) 1984-04-04 EP disclosed