SCHEMBL19419239

SCHEMBL19419239

CCCCCCc1cc2sc3cc4c(cc3c2s1)sc1cc(CCCCC)sc14

nearest known ligand 0.35

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ GPR35 Q9HC97 2/20 0.35
▸ PTGS2 P35354 3/20 0.34
▸ MAPT P10636 2/20 0.32
▸ ALDH1A1 P00352 2/20 0.32
▸ CYP3A4 P08684 3/20 0.32
▸ TP53 P04637 2/20 0.31
▸ MEN1 O00255 1/20 0.31
▸ ALOX5 P09917 1/20 0.31
▸ TYR P14679 1/20 0.31
▸ ALOX15 P16050 1/20 0.31
▸ TSHR P16473 1/20 0.31
▸ HTT P42858 1/20 0.31
▸ KMT2A Q03164 1/20 0.31
▸ TDP1 Q9NUW8 1/20 0.31
▸ KDM4E B2RXH2 1/20 0.31
▸ LMNA P02545 1/20 0.31
▸ ESR1 P03372 1/20 0.31
▸ SHBG P04278 1/20 0.31
▸ ADRA2A P08913 1/20 0.31
▸ ADORA3 P0DMS8 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL19419252 1.00 GPR35 (0.35) GPR35PTGS2MAPTALDH1A1CYP3A4
SCHEMBL23332266 1.00 GPR35 (0.35) GPR35PTGS2MAPTALDH1A1CYP3A4
SCHEMBL19419244 0.98 GPR35 (0.35) GPR35PTGS2MAPTALDH1A1CYP3A4
SCHEMBL19419238 0.97 LMNA (0.33) GPR35PTGS2ALDH1A1CYP3A4MEN1
SCHEMBL19419251 0.93 LMNA (0.35) MAPTALDH1A1MEN1KMT2ALMNA
SCHEMBL19531790 0.92 PKM (0.33) GPR35PTGS2
SCHEMBL14925168 0.92 GPR35 (0.33) GPR35PTGS2MAPT
SCHEMBL19220741 0.92 GPR35 (0.33) GPR35PTGS2MAPT
SCHEMBL17086857 0.91 GPR35 (0.32) GPR35
SCHEMBL18700678 0.89 GPR35 (0.30) GPR35

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20170288152-A1 COMPOSITION FOR FORMING ORGANIC SEMICONDUCTOR FILM, ORGANIC SEMICONDUCTOR FILM, MANUFACTURING METHOD THEREOF, ORGANIC SEMICONDUCTOR ELEMENT, AND MANUFACTURING METHOD THEREOF FUJIFILM CORPORATION (JP) 2017-10-05 — — US disclosed
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