SCHEMBL19457792

SCHEMBL19457792

CCC(C)(I)C(=O)OCC1CC2CC(CC(C)(O)C(F)(F)F)C1C2

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL20215479 0.91 — —
SCHEMBL20820948 0.81 — —
SCHEMBL19457779 0.81 — —
SCHEMBL20215497 0.79 — —
SCHEMBL21599229 0.78 ALDH1A1 (0.32) —
SCHEMBL18457347 0.78 ALDH1A1 (0.38) —
SCHEMBL18844174 0.74 — —
SCHEMBL111963 0.73 — —
SCHEMBL10115802 0.73 — —
SCHEMBL18476617 0.73 — —

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9790166-B2 Polymer, monomer, resist composition, and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2017-10-17 — — US disclosed
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