SCHEMBL20215497

SCHEMBL20215497

CCC(C)(I)C(=O)OCCC1CC2CC(CC(O)(C(F)(F)F)C(F)(F)F)C1C2

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL20215479 0.88 — —
SCHEMBL20820948 0.80 — —
SCHEMBL19457792 0.79 — —
SCHEMBL20820947 0.78 — —
SCHEMBL18455465 0.78 THRB (0.33) —
SCHEMBL20215496 0.75 — —
SCHEMBL18476617 0.74 — —
SCHEMBL20215495 0.72 — —
SCHEMBL20820968 0.72 — —
SCHEMBL12009336 0.71 — —

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9989847-B2 Onium salt compound, resist composition, and pattern forming process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2018-06-05 — — US disclosed
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