SCHEMBL19462002

SCHEMBL19462002

COc1c(O)ccc2c1C(=O)c1cccc(O)c1C2=O

nearest known ligand 0.66

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
MAOA P21397 3/20 0.66
EGFR P00533 1/20 0.61
PIM1 P11309 1/20 0.61
MEN1 O00255 5/20 0.58
KMT2A Q03164 5/20 0.58
MAPT P10636 6/20 0.58
ALDH1A1 P00352 4/20 0.58
SMN1; SMN2 Q16637 3/20 0.58
MAPK1 P28482 3/20 0.58
TDP1 Q9NUW8 3/20 0.58
TSHR P16473 2/20 0.58
HPGD P15428 2/20 0.58
ALOX15 P16050 2/20 0.58
HSD17B10 Q99714 2/20 0.58
LMNA P02545 1/20 0.58
MAOB P27338 1/20 0.58
HTT P42858 1/20 0.58
NPC1 O15118 2/20 0.54
RAB9A P51151 2/20 0.54
ELANE P08246 2/20 0.53

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL19462005 0.95 MAOA (0.67) MAOAEGFRPIM1MEN1KMT2A
SCHEMBL1426442 0.88 SMN1; SMN2 (0.70) MAOAEGFRPIM1MEN1KMT2A
SCHEMBL29906115 0.88 SMN1; SMN2 (0.70) MAOAEGFRPIM1MEN1KMT2A
SCHEMBL22394347 0.84 PIM1 (0.63) MAOAEGFRPIM1MEN1KMT2A
SCHEMBL5146135 0.84 SMN1; SMN2 (0.69) MAOAEGFRPIM1MEN1KMT2A
Anthrarufin SCHEMBL29363946 0.81 MAOA (1.00) MAOAMEN1KMT2AMAPTALDH1A1
Anthrarufin SCHEMBL29874705 0.81 MAOA (1.00) MAOAMEN1KMT2AMAPTALDH1A1
Anthrarufin SCHEMBL187843 0.81 MAOA (1.00) MAOAMEN1KMT2AMAPTALDH1A1
SCHEMBL11797236 0.81 EGFR (0.84) MAOAEGFRPIM1MEN1KMT2A
Juzunol SCHEMBL16226815 0.79 MAOA (0.51) MAOAEGFRPIM1MEN1KMT2A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 13 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-108700808-B Masking resist composition for etching, method for producing substrate using same, and method for producing light-emitting element 东丽株式会社 2024-04-05 CN disclosed
US-11640110-B2 Resin composition, method for producing heat-resistant resin film, and display device TORAY INDUSTRIES, INC. (JP) 2023-05-02 US disclosed
EP-3369780-B1 METHOD FOR MANUFACTURING SUBSTRATE AND METHOD FOR MANUFACTURING LIGHT EMITTING ELEMENT USING SAME TORAY INDUSTRIES (JP) 2022-10-26 EP disclosed
CN-106715597-B Resin composition, method for producing heat-resistant resin film, and display device 东丽株式会社 2022-03-01 CN disclosed
CN-108291087-B Method for manufacturing substrate and method for manufacturing light-emitting element using same 东丽株式会社 2020-09-15 CN disclosed
US-20200192227-A1 RESIN COMPOSITION, METHOD FOR PRODUCING HEAT-RESISTANT RESIN FILM, AND DISPLAY DEVICE TORAY INDUSTRIES, INC. (JP) 2020-06-18 US disclosed
US-10418521-B2 Method for manufacturing substrate and method for manufacturing light emitting element using same TORAY INDUSTRIES, INC. (JP) 2019-09-17 US disclosed
US-20180309022-A1 METHOD FOR MANUFACTURING SUBSTRATE AND METHOD FOR MANUFACTURING LIGHT EMITTING ELEMENT USING SAME TORAY INDUSTRIES, INC. (JP) 2018-10-25 US disclosed
CN-108700808-A Etching masking anti-corrosion agent composition uses the manufacturing method of its substrate and the manufacturing method of light-emitting component 东丽株式会社 2018-10-23 CN disclosed
EP-3369780-A1 METHOD FOR MANUFACTURING SUBSTRATE AND METHOD FOR MANUFACTURING LIGHT EMITTING ELEMENT USING SAME Toray Industries, Inc. (JP) 2018-09-05 EP disclosed
CN-108291087-A The manufacturing method of substrate and the manufacturing method for using its light-emitting component 东丽株式会社 2018-07-17 CN disclosed
US-20170299965-A1 RESIN COMPOSITION, METHOD FOR PRODUCING HEAT-RESISTANT RESIN FILM, AND DISPLAY DEVICE TORAY INDUSTRIES, INC. (JP) 2017-10-19 US disclosed
CN-106715597-A Resin composition, method for producing heat-resistant resin film, and display device 东丽株式会社 2017-05-24 CN disclosed