SCHEMBL1948488

SCHEMBL1948488

CC(C)(CCC(C)(C)OC(=O)COC=O)OC(=O)COC=O

nearest known ligand 0.30

Predicted protein targets (top 1)

geneUniProtsupporting neighboursconfidence
GAA P10253 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL14435187 0.90
SCHEMBL1982813 0.87
SCHEMBL3363554 0.83 CYP2D6 (0.36)
SCHEMBL10244600 0.78 CYP2D6 (0.30)
SCHEMBL16256491 0.76 GAA (0.33) GAA
SCHEMBL11909511 0.75
SCHEMBL13742326 0.72 GAA (0.40) GAA
SCHEMBL16256440 0.71 GAA (0.30) GAA
SCHEMBL4839421 0.70 ALDH1A1 (0.36) GAA
SCHEMBL838392 0.70

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 14 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8895691-B2 Acid-labile polymers and monomers for their construction THE RESEARCH FOUNDATION OF STATE UNIVERSITY OF NEW YORK (US) 2014-11-25 US disclosed
US-8895691-B2 Acid-labile polymers and monomers for their construction THE RESEARCH FOUNDATION OF STATE UNIVERSITY OF NEW YORK (US) 2014-11-25 US disclosed
US-8895691-B2 Acid-labile polymers and monomers for their construction THE RESEARCH FOUNDATION OF STATE UNIVERSITY OF NEW YORK (US) 2014-11-25 US disclosed
US-8349990-B2 Chain scission polyester polymers for photoresists THE RESEARCH FOUNDATION OF STATE UNIVERSITY OF NEW YORK (US) 2013-01-08 US disclosed
US-8349990-B2 Chain scission polyester polymers for photoresists THE RESEARCH FOUNDATION OF STATE UNIVERSITY OF NEW YORK (US) 2013-01-08 US disclosed
US-8349990-B2 Chain scission polyester polymers for photoresists THE RESEARCH FOUNDATION OF STATE UNIVERSITY OF NEW YORK (US) 2013-01-08 US disclosed
US-20110152496-A1 ACID-LABILE POLYMERS AND MONOMERS FOR THEIR CONSTRUCTION THE RESEARCH FOUNDATION OF STATE UNIVERSITY OF NEW YORK (US) 2011-06-23 US disclosed
US-20110152496-A1 ACID-LABILE POLYMERS AND MONOMERS FOR THEIR CONSTRUCTION THE RESEARCH FOUNDATION OF STATE UNIVERSITY OF NEW YORK (US) 2011-06-23 US disclosed
US-20110152496-A1 ACID-LABILE POLYMERS AND MONOMERS FOR THEIR CONSTRUCTION THE RESEARCH FOUNDATION OF STATE UNIVERSITY OF NEW YORK (US) 2011-06-23 US disclosed
US-20110127651-A1 CHAIN SCISSION POLYESTER POLYMERS FOR PHOTORESISTS THE RESEARCH FOUNDATION OF STATE UNIVERSITY OF NEW (US) 2011-06-02 US disclosed
US-20110127651-A1 CHAIN SCISSION POLYESTER POLYMERS FOR PHOTORESISTS THE RESEARCH FOUNDATION OF STATE UNIVERSITY OF NEW (US) 2011-06-02 US disclosed
US-20110127651-A1 CHAIN SCISSION POLYESTER POLYMERS FOR PHOTORESISTS THE RESEARCH FOUNDATION OF STATE UNIVERSITY OF NEW (US) 2011-06-02 US disclosed
WO-2009105667-A2 CHAIN SCISSION POLYESTER POLYMERS FOR PHOTORESISTS THE RESEARCH FOUNDATION OF STATE UNIVERSITY OF NEW YORK (US) 2009-08-27 WO disclosed
WO-2009105667-A2 CHAIN SCISSION POLYESTER POLYMERS FOR PHOTORESISTS THE RESEARCH FOUNDATION OF STATE UNIVERSITY OF NEW YORK (US) 2009-08-27 WO disclosed