Predicted protein targets (top 13)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CYP2D6 | P10635 | 1/20 | 0.36 |
| ▸ | HDAC3 | O15379 | 1/20 | 0.35 |
| ▸ | HDAC1 | Q13547 | 1/20 | 0.35 |
| ▸ | HDAC2 | Q92769 | 1/20 | 0.35 |
| ▸ | HDAC8 | Q9BY41 | 1/20 | 0.35 |
| ▸ | HDAC6 | Q9UBN7 | 1/20 | 0.35 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.35 |
| ▸ | CTSK | P43235 | 3/20 | 0.33 |
| ▸ | DGAT1 | O75907 | 1/20 | 0.32 |
| ▸ | CA12 | O43570 | 1/20 | 0.31 |
| ▸ | CA2 | P00918 | 1/20 | 0.31 |
| ▸ | CA14 | Q9ULX7 | 1/20 | 0.31 |
| ▸ | APLNR | P35414 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL1948488 | 0.83 | GAA (0.30) | — | |
| SCHEMBL10244600 | 0.81 | CYP2D6 (0.30) | CYP2D6 | |
| SCHEMBL20398153 | 0.80 | HDAC3 (0.34) | CYP2D6HDAC3HDAC1HDAC2HDAC8 | |
| SCHEMBL20398163 | 0.78 | CTSK (0.34) | CYP2D6HDAC3HDAC1HDAC2HDAC8 | |
| SCHEMBL20398164 | 0.78 | CTSK (0.34) | CYP2D6HDAC3HDAC1HDAC2HDAC8 | |
| SCHEMBL9481603 | 0.78 | HDAC6 (0.37) | CYP2D6HDAC3HDAC1HDAC2HDAC8 | |
| SCHEMBL14435187 | 0.78 | — | — | |
| SCHEMBL11909511 | 0.78 | — | — | |
| SCHEMBL6688426 | 0.75 | DGAT1 (0.37) | CYP2D6HDAC3HDAC1HDAC2HDAC8 | |
| SCHEMBL7652660 | 0.75 | EPHX2 (0.35) | HDAC3HDAC1HDAC2HDAC8HDAC6 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 57 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-6403280-B1 | TERPOLYMER COMPRISING MALEIC ANHYDRIDE, NORBORNENE ESTER DERIVATIVE, AND ALICYCLIC (METH)ACRYLATE MONOMERS; DURABILITY TO DRY ETCHING; TRANSPARENCY, STORAGE STABILITY | JSR CORPORATION (JP) | 2002-06-11 | — | — | US | claimed |
| US-6180316-B1 | SUITABLE FOR USE AS CHEMICALLY AMPLIFIED RESIST USED IN MANUFACTURING OF INTEGRATED CIRCUITS | JSR CORPORATION (JP) | 2001-01-30 | — | — | US | claimed |
| EP-1048983-A1 | Radiation sensitive resin composition | JSR Corporation (JP) | 2000-11-02 | — | — | EP | claimed |
| US-11886119-B2 | Material for forming underlayer film, resist underlayer film, method of producing resist underlayer film, and laminate | MITSUI CHEMICALS, INC. (JP) | 2024-01-30 | — | — | US | disclosed |
| WO-2023249926-A2 | FLUORINATED ZWITTERIONIC POLYMERS AND METHODS OF USE | CORNELL UNIVERSITY (US) | 2023-12-28 | — | — | WO | disclosed |
| US-20230185195-A1 | MATERIAL FOR FORMING UNDERLAYER FILM, RESIST UNDERLAYER FILM, METHOD OF PRODUCING RESIST UNDERLAYER FILM, AND LAMINATE | MITSUI CHEMICALS, INC. (JP) | 2023-06-15 | — | — | US | disclosed |
| US-11599025-B2 | Resin material for forming underlayer film, resist underlayer film, method of producing resist underlayer film, and laminate | MITSUI CHEMICALS, INC. (JP) | 2023-03-07 | — | — | US | disclosed |
| US-20200264511-A1 | MATERIAL FOR FORMING UNDERLAYER FILM, RESIST UNDERLAYER FILM, METHOD OF PRODUCING RESIST UNDERLAYER FILM, AND LAMINATE | MITSUI CHEMICALS, INC. (JP) | 2020-08-20 | — | — | US | disclosed |
| EP-3693793-A1 | RESIN MATERIAL FOR FORMING UNDERLAYER FILM, RESIST UNDERLAYER FILM, METHOD FOR PRODUCING RESIST UNDERLAYER FILM, AND LAYERED PRODUCT | Mitsui Chemicals, Inc. (JP) | 2020-08-12 | — | — | EP | disclosed |
| US-20200241419-A1 | RESIN MATERIAL FOR FORMING UNDERLAYER FILM, RESIST UNDERLAYER FILM, METHOD OF PRODUCING RESIST UNDERLAYER FILM, AND LAMINATE | MITSUI CHEMICALS, INC. (JP) | 2020-07-30 | — | — | US | disclosed |
| CN-111183395-A | Resin material for forming underlayer film, resist underlayer film, method for producing resist underlayer film, and laminate | 三井化学株式会社 | 2020-05-19 | — | — | CN | disclosed |
| US-5110921-A | Bactericides | FUJISAWA PHARMACEUTICAL CO., LTD. (JP) | 1992-05-05 | — | — | US | disclosed |
| US-4960889-A | CEPHALOSPORIN INTERMEDIATES | FUJISAWA PHARMACEUTICAL CO., LTD. (JP) | 1990-10-02 | — | — | US | disclosed |
| US-4948898-A | MICROBIOCIDE DERIVATIVES | HOFFMANN-LA ROCHE INC. (US) | 1990-08-14 | — | — | US | disclosed |
| EP-0096297-B1 | PROCESS FOR THE PREPARATION OF 1-SULFO-2-OXOAZETIDINE DERIVATIVES | F. HOFFMANN-LA ROCHE & CO. Aktiengesellschaft (CH) | 1988-06-15 | — | — | EP | disclosed |
| US-4731443-A | 7-acylamino-3-vinylcephalosporanic acid derivatives | FUJISAWA PHARMACEUTICAL CO., LTD. (JP) | 1988-03-15 | — | — | US | disclosed |
| US-4652651-A | Process for the manufacture of 1-sulpho-2-oxoazetidine carboxylic acid intermediates via catalytic ester cleavage | HOFFMANN-LA ROCHE INC. (US) | 1987-03-24 | — | — | US | disclosed |
| US-4487927-A | BACTERICIDES | FUJISAWA PHARMACEUTICAL CO., LTD. (JP) | 1984-12-11 | — | — | US | disclosed |
| US-4423213-A | ANTIBIOTIC | FUJISAWA PHARMACEUTICAL CO., LTD. (JP) | 1983-12-27 | — | — | US | disclosed |
| EP-0096297-A2 | Process for the preparation of 1-sulfo-2-oxoazetidine derivatives | F. HOFFMANN-LA ROCHE & CO. Aktiengesellschaft (CH) | 1983-12-21 | — | — | EP | disclosed |