SCHEMBL10244600

SCHEMBL10244600

CC(C)C(C)(C)OC(=O)COC=O

nearest known ligand 0.30

Predicted protein targets (top 1)

geneUniProtsupporting neighboursconfidence
CYP2D6 P10635 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL3363554 0.81 CYP2D6 (0.36) CYP2D6
SCHEMBL1948488 0.78 GAA (0.30)
SCHEMBL25899516 0.74 PGD (0.33)
SCHEMBL14549271 0.73 ALDH1A1 (0.36)
SCHEMBL28312360 0.73 TSHR (0.39) CYP2D6
SCHEMBL11909511 0.73
SCHEMBL14435187 0.73
SCHEMBL7061052 0.72 LMNA (0.41) CYP2D6
SCHEMBL16684206 0.72 PRKCA (0.39)
SCHEMBL12332049 0.72 ALOX15 (0.38)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-2468742-A1 Actinic ray-sensitive or radiation-sensitive resin composition, pattern forming method using the same, polymerizable compound and polymer compound obtained by polymerizing the polymerizable compound Fujifilm Corporation (JP) 2012-06-27 EP disclosed
EP-2450746-A1 Positive resist composition and pattern forming method using the composition Fujifilm Corporation (JP) 2012-05-09 EP disclosed