SCHEMBL194873

SCHEMBL194873

CN(C)c1ccc(C(=O)C(C)(C)O)cc1

nearest known ligand 0.59

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 7/20 0.59
MAPT P10636 4/20 0.59
HPGD P15428 3/20 0.59
NPC1 O15118 5/20 0.52
RAB9A P51151 4/20 0.52
SLC2A1 P11166 1/20 0.48
KMT2A Q03164 5/20 0.47
MEN1 O00255 4/20 0.47
MAPK1 P28482 2/20 0.47
POLB P06746 2/20 0.47
KDM4E B2RXH2 2/20 0.47
HDAC1 Q13547 2/20 0.47
HDAC6 Q9UBN7 2/20 0.47
TSHR P16473 3/20 0.47
ALOX15 P16050 3/20 0.47
CYP3A4 P08684 1/20 0.47
HBB P68871 1/20 0.47
HSD17B10 Q99714 3/20 0.46
TDP1 Q9NUW8 1/20 0.46
GAA P10253 2/20 0.43

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL10944669 0.94 ALDH1A1 (0.70) ALDH1A1MAPTHPGDNPC1RAB9A
SCHEMBL855138 0.85 ALDH1A1 (0.61) ALDH1A1MAPTHPGDNPC1RAB9A
SCHEMBL11298330 0.84 CA2 (0.46) ALDH1A1HDAC1TSHRSMN1; SMN2TP53
SCHEMBL10713283 0.82 ALDH1A1 (0.53) ALDH1A1MAPTHPGDNPC1RAB9A
SCHEMBL727322 0.82 ALDH1A1 (0.57) ALDH1A1MAPTHPGDNPC1RAB9A
SCHEMBL9681080 0.82 ALDH1A1 (0.57) ALDH1A1MAPTHPGDNPC1RAB9A
SCHEMBL14506290 0.81 ALDH1A1 (0.52) ALDH1A1MAPTHPGDNPC1RAB9A
SCHEMBL5949981 0.79 MAPT (0.59) ALDH1A1MAPTHPGDNPC1RAB9A
SCHEMBL9680485 0.79 ALDH1A1 (0.53) ALDH1A1MAPTHPGDNPC1RAB9A
SCHEMBL10711391 0.79 ALDH1A1 (0.53) ALDH1A1MAPTHPGDNPC1RAB9A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 71 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20240317942-A1 THIOL-CONTAINING COMPOSITION, PHOTOSETTING COMPOSITION, AND THERMOSETTING COMPOSITION RESONAC CORPORATION (JP) 2024-09-26 US disclosed
EP-4375302-A1 THIOL-CONTAINING COMPOSITION, PHOTOCURABLE COMPOSITION, AND THERMOSETTING COMPOSITION Resonac Corporation (JP) 2024-05-29 EP disclosed
CN-117651722-A Thiol-containing composition, photocurable composition, and thermosetting composition 株式会社力森诺科 2024-03-05 CN disclosed
WO-2023003011-A1 THIOL-CONTAINING COMPOSITION, PHOTOCURABLE COMPOSITION, AND THERMOSETTING COMPOSITION 昭和電工株式会社 2023-01-26 WO disclosed
US-8962226-B2 Organic photoreceptor, image forming apparatus, and process cartridge Konica Minolta, Inc. (JP) 2015-02-24 US disclosed
US-8753801-B2 Photosensitive composition, pattern forming material, and photosensitive film, pattern forming method, pattern film, low refractive index film, optical device and solid-state imaging device each using the same FUJIFILM CORPORATION (JP) 2014-06-17 US disclosed
US-8669025-B2 Polymerizable composition, cured film, color filter, method of producing color filter and solid-state image sensor FUJIFILM CORPORATION (JP) 2014-03-11 US disclosed
US-8557486-B2 Organic photoreceptor, manufacturing method of organic photoreceptor, and image forming apparatus KONICA MINOLTA BUSINESS TECHNOLOGIES, INC. (JP) 2013-10-15 US disclosed
US-8557486-B2 Organic photoreceptor, manufacturing method of organic photoreceptor, and image forming apparatus KONICA MINOLTA BUSINESS TECHNOLOGIES, INC. (JP) 2013-10-15 US disclosed
EP-2042568-B1 Ink composition, inkjet recording method, and printed material FUJIFILM CORP (JP) 2013-10-02 EP disclosed
EP-1478668-A2 THIOL COMPOUND, PHOTOPOLYMERIZATION INITIATOR COMPOSITION AND PHOTOSENSITIVE COMPOSITION Showa Denko K.K. (JP) 2004-11-24 EP disclosed
WO-2004055596-A1 COLOR FILTER BLACK MATRIX RESIST COMPOSITION SHOWA DENKO K. K. (JP) 2004-07-01 WO disclosed
WO-2003072614-A2 THIOL COMPOUND, PHOTOPOLYMERIZATION INITIATOR COMPOSITION AND PHOTOSENSITIVE COMPOSITION SHOWA DENKO K.K. (JP) 2003-09-04 WO disclosed
US-4721734-A PHOTOPOLYMERIZATION OF UNSATURATED COMPOUNDS MERCK PATENT GESELLSCHAFT MIT BESCHRANKTER HAFTUNG (DE) 1988-01-26 US disclosed
US-4477681-A PHOTOPOLYMERIZATION AND HARDENING OF PRINTING DYES MERCK PATENT GESELLSCHAFT MIT BESCHRANKTER HAFTUNG (DE) 1984-10-16 US disclosed
US-4347111-A PHOTOPOLYMERIZATION OF UNSATURATED COMPOUNDS, HARDENING OF PRINTING DYES MERCK PATENT GESELLSCHAFT MIT BESCHRANKTER HAFTUNG (DE) 1982-08-31 US disclosed
US-4321118-A Bis benzoyl sensitizers for photopolymerization or photo cross linking process and composition CIBA-GEIGY CORPORATION (US) 1982-03-23 US disclosed
US-4318791-A PHOTOPOLYMERIZABLE SYSTEM FOR INKS CIBA-GEIGY CORPORATION (US) 1982-03-09 US disclosed
US-4315807-A Sensitizers for photopolymerization CIBA-GEIGY CORPORATION (US) 1982-02-16 US disclosed
US-4308400-A AROMATIC HYDROXY KETONES CIBA-GEIGY A.G. (CH) 1981-12-29 US disclosed