Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | METAP2 | P50579 | 1/20 | 0.46 |
| ▸ | KDM4E | B2RXH2 | 8/20 | 0.45 |
| ▸ | HPGD | P15428 | 6/20 | 0.45 |
| ▸ | KMT2A | Q03164 | 3/20 | 0.45 |
| ▸ | MEN1 | O00255 | 2/20 | 0.45 |
| ▸ | L3MBTL1 | Q9Y468 | 2/20 | 0.45 |
| ▸ | CYP1A2 | P05177 | 5/20 | 0.41 |
| ▸ | CYP2C9 | P11712 | 3/20 | 0.41 |
| ▸ | MAPT | P10636 | 2/20 | 0.41 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.41 |
| ▸ | ACHE | P22303 | 2/20 | 0.40 |
| ▸ | BACE1 | P56817 | 2/20 | 0.40 |
| ▸ | AHR | P35869 | 1/20 | 0.40 |
| ▸ | ALDH1A1 | P00352 | 4/20 | 0.39 |
| ▸ | CYP2C19 | P33261 | 3/20 | 0.39 |
| ▸ | CYP2D6 | P10635 | 2/20 | 0.39 |
| ▸ | NPSR1 | Q6W5P4 | 2/20 | 0.39 |
| ▸ | NPY1R | P25929 | 1/20 | 0.39 |
| ▸ | NPY2R | P49146 | 1/20 | 0.39 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.39 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL195260 | 1.00 | METAP2 (0.46) | METAP2KDM4EHPGDKMT2AMEN1 | |
| SCHEMBL321610 | 0.87 | HPGD (0.48) | KDM4EHPGDKMT2AMEN1L3MBTL1 | |
| SCHEMBL321609 | 0.87 | HPGD (0.48) | KDM4EHPGDKMT2AMEN1L3MBTL1 | |
| SCHEMBL2739641 | 0.85 | KDM4E (0.58) | METAP2KDM4EHPGDKMT2AMEN1 | |
| SCHEMBL9687509 | 0.85 | KDM4E (0.58) | METAP2KDM4EHPGDKMT2AMEN1 | |
| SCHEMBL8956565 | 0.85 | KDM4E (0.58) | METAP2KDM4EHPGDKMT2AMEN1 | |
| SCHEMBL126561 | 0.85 | MAOB (0.45) | KDM4EHPGDKMT2AMEN1CYP1A2 | |
| SCHEMBL126560 | 0.85 | MAOB (0.45) | KDM4EHPGDKMT2AMEN1CYP1A2 | |
| SCHEMBL195495 | 0.85 | HPGD (0.49) | KDM4EHPGDKMT2AMEN1L3MBTL1 | |
| SCHEMBL195496 | 0.85 | HPGD (0.49) | KDM4EHPGDKMT2AMEN1L3MBTL1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 141 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-0137228-B1 | PHOTOPOLYMERIZABLE COMPOSITION | FUJI PHOTO FILM CO., LTD. (JP) | 1988-10-05 | — | — | EP | claimed |
| EP-0137228-A2 | Photopolymerizable composition | FUJI PHOTO FILM CO., LTD. (JP) | 1985-04-17 | — | — | EP | claimed |
| EP-3392292-B1 | METHOD FOR PRODUCING HETEROCYCLE-CONTAINING POLYMER PRECURSOR, HETEROCYCLE-CONTAINING POLYMER PRECURSOR, AND USE FOR SAME | FUJIFILM CORP (JP) | 2023-06-28 | — | — | EP | disclosed |
| EP-3162868-B1 | THERMAL BASE GENERATOR, THERMOSETTING RESIN COMPOSITION, CURED FILM, CURED FILM MANUFACTURING METHOD, AND SEMICONDUCTOR DEVICE | FUJIFILM CORP (JP) | 2022-10-05 | — | — | EP | disclosed |
| CN-108700836-B | Method for manufacturing laminate and method for manufacturing semiconductor device | 富士胶片株式会社 | 2022-06-28 | — | — | CN | disclosed |
| CN-107966877-B | Composition for color filter | 富士胶片株式会社 | 2022-04-12 | — | — | CN | disclosed |
| CN-107709407-B | Polyimide precursor composition, photosensitive resin composition, cured film, method for producing cured film, semiconductor device, and method for producing polyimide precursor composition | 富士胶片株式会社 | 2020-11-17 | — | — | CN | disclosed |
| US-10780679-B2 | Laminate, method for manufacturing laminate, semiconductor device, and method for manufacturing the semiconductor device | FUJIFILM CORPORATION (JP) | 2020-09-22 | — | — | US | disclosed |
| EP-3339352-B1 | RESIN, COMPOSITION, CURED FILM, METHOD FOR MANUFACTURING CURED FILM AND SEMICONDUCTOR DEVICE | FUJIFILM CORP (JP) | 2020-09-16 | — | — | EP | disclosed |
| CN-108137803-B | Resin, composition, cured film, method for producing cured film, and semiconductor device | 富士胶片株式会社 | 2020-04-17 | — | — | CN | disclosed |
| CN-107709408-B | Precursor composition, photosensitive resin composition, method for producing precursor composition, cured film, method for producing cured film, and semiconductor device | 富士胶片株式会社 | 2020-02-14 | — | — | CN | disclosed |
| WO-2005078776-A1 | PATTERN FORMING PROCESS | FUJI PHOTO FILM CO., LTD. (JP) | 2005-08-25 | — | — | WO | disclosed |
| US-5171655-A | Acrylic esters or amides containing pendant maleimide groups; photoresists; short exposure times using scanning laser rays; workability | FUJI PHOTO FILM CO., LTD. (JP) | 1992-12-15 | — | — | US | disclosed |
| US-5030548-A | Photoiniator system comprising a 4,4'-bis(dialkylamino) benzophenone, an aromatic ketone and lophine dimer; also present a halogen compound leuco and dye; lithography; printing plates; photoresists | FUJI PHOTO FILM CO., LTD. (JP) | 1991-07-09 | — | — | US | disclosed |
| US-4950582-A | CONTAINING POLYURETHANE CONTAINING N-AMINOSULFONYLAMIDO GROUP | FUJI PHOTO FILM CO., LTD. (JP) | 1990-08-21 | — | — | US | disclosed |
| US-4877711-A | DURABLE PRINTING PLATES | FUJI PHOTO FILM CO., LTD. (JP) | 1989-10-31 | — | — | US | disclosed |
| US-4661434-A | PHOTORESISTS | FUJI PHOTO FILM CO., LTD. (JP) | 1987-04-28 | — | — | US | disclosed |
| US-4657942-A | LITHOGRAPHIC PRINTING PLATES, RESIN LETTERPRESS, RESISTS, 2-MERCAPTO-1,3,4-TIADIAZOLE FOR INCREASED SENSITIVITY | FUJI PHOTO FILM CO., LTD. (JP) | 1987-04-14 | — | — | US | disclosed |
| US-4584260-A | 4,41-BIS(DIALKYLAMINO)BENZOPHENONE A BENZOPHENONE, 1,3,4-OXADIAZOLE COMPOUND, AROMATIC HALOGENATED SULFONE, QUINAZOLINE AND TRIAZINE COMPOUND | FUJI PHOTO FILM CO., LTD. (JP) | 1986-04-22 | — | — | US | disclosed |
| EP-0137228-A2 | Photopolymerizable composition | FUJI PHOTO FILM CO., LTD. (JP) | 1985-04-17 | — | — | EP | disclosed |