Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | KDM4E | B2RXH2 | 6/20 | 0.58 |
| ▸ | CYP1A2 | P05177 | 6/20 | 0.58 |
| ▸ | CYP2C9 | P11712 | 4/20 | 0.58 |
| ▸ | MAPT | P10636 | 3/20 | 0.58 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.58 |
| ▸ | HPGD | P15428 | 7/20 | 0.54 |
| ▸ | SMN1; SMN2 | Q16637 | 6/20 | 0.54 |
| ▸ | NPC1 | O15118 | 5/20 | 0.54 |
| ▸ | RAB9A | P51151 | 5/20 | 0.54 |
| ▸ | CYP2C19 | P33261 | 5/20 | 0.50 |
| ▸ | ALDH1A1 | P00352 | 4/20 | 0.50 |
| ▸ | CYP2D6 | P10635 | 3/20 | 0.50 |
| ▸ | NPSR1 | Q6W5P4 | 3/20 | 0.50 |
| ▸ | CASP3 | P42574 | 2/20 | 0.50 |
| ▸ | SENP8 | Q96LD8 | 2/20 | 0.50 |
| ▸ | SENP7 | Q9BQF6 | 2/20 | 0.50 |
| ▸ | SENP6 | Q9GZR1 | 2/20 | 0.50 |
| ▸ | NFE2L2 | Q16236 | 3/20 | 0.39 |
| ▸ | RELA | Q04206 | 1/20 | 0.37 |
| ▸ | TDP1 | Q9NUW8 | 2/20 | 0.36 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL8956565 | 1.00 | KDM4E (0.58) | KDM4ECYP1A2CYP2C9MAPTCYP3A4 | |
| SCHEMBL9687509 | 1.00 | KDM4E (0.58) | KDM4ECYP1A2CYP2C9MAPTCYP3A4 | |
| SCHEMBL195259 | 0.85 | METAP2 (0.46) | KDM4ECYP1A2CYP2C9MAPTCYP3A4 | |
| SCHEMBL195260 | 0.85 | METAP2 (0.46) | KDM4ECYP1A2CYP2C9MAPTCYP3A4 | |
| SCHEMBL321610 | 0.85 | HPGD (0.48) | KDM4ECYP1A2CYP2C9MAPTCYP3A4 | |
| SCHEMBL321609 | 0.85 | HPGD (0.48) | KDM4ECYP1A2CYP2C9MAPTCYP3A4 | |
| SCHEMBL126561 | 0.84 | MAOB (0.45) | KDM4ECYP1A2CYP2C9MAPTCYP3A4 | |
| SCHEMBL126560 | 0.84 | MAOB (0.45) | KDM4ECYP1A2CYP2C9MAPTCYP3A4 | |
| SCHEMBL195495 | 0.83 | HPGD (0.49) | KDM4ECYP1A2CYP2C9MAPTCYP3A4 | |
| SCHEMBL195496 | 0.83 | HPGD (0.49) | KDM4ECYP1A2CYP2C9MAPTCYP3A4 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 89 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8647813-B2 | Photosensitive composition and photosensitive lithographic printing plate material | MITSUBISHI PAPER MILLS LIMITED (JP) | 2014-02-11 | — | — | US | disclosed |
| US-8647813-B2 | Photosensitive composition and photosensitive lithographic printing plate material | MITSUBISHI PAPER MILLS LIMITED (JP) | 2014-02-11 | — | — | US | disclosed |
| US-8632953-B2 | Process for making lithographic printing plate | FUJIFILM CORPORATION (JP) | 2014-01-21 | — | — | US | disclosed |
| US-8632953-B2 | Process for making lithographic printing plate | FUJIFILM CORPORATION (JP) | 2014-01-21 | — | — | US | disclosed |
| US-20130022927-A1 | PHOTOSENSITIVE COMPOSITION AND PHOTOSENSITIVE LITHOGRAPHIC PRINTING PLATE MATERIAL | MITSUBISHI PAPER MILLS LIMITED (JP) | 2013-01-24 | — | — | US | disclosed |
| US-20130022927-A1 | PHOTOSENSITIVE COMPOSITION AND PHOTOSENSITIVE LITHOGRAPHIC PRINTING PLATE MATERIAL | MITSUBISHI PAPER MILLS LIMITED (JP) | 2013-01-24 | — | — | US | disclosed |
| US-RE43560-E1 | Positive photosensitive compositions | FUJIFILM CORPORATION (JP) | 2012-07-31 | — | — | US | disclosed |
| US-RE43560-E1 | Positive photosensitive compositions | FUJIFILM CORPORATION (JP) | 2012-07-31 | — | — | US | disclosed |
| US-8088552-B2 | Photosensitive composition and lithographic printing original plate using the composition | OKAMOTO CHEMICAL INDUSTRY CO., LTD. (JP) | 2012-01-03 | — | — | US | disclosed |
| US-8088552-B2 | Photosensitive composition and lithographic printing original plate using the composition | OKAMOTO CHEMICAL INDUSTRY CO., LTD. (JP) | 2012-01-03 | — | — | US | disclosed |
| US-20070092836-A1 | Lithographic printing plate precursor and lithographic printing method | FUJIFILM CORPORATION (JP) | 2007-04-26 | — | — | US | disclosed |
| US-20070092836-A1 | Lithographic printing plate precursor and lithographic printing method | FUJIFILM CORPORATION (JP) | 2007-04-26 | — | — | US | disclosed |
| US-7179578-B2 | Positive resist composition | FUJI PHOTO FILM CO., LTD. (JP) | 2007-02-20 | — | — | US | disclosed |
| US-7179578-B2 | Positive resist composition | FUJI PHOTO FILM CO., LTD. (JP) | 2007-02-20 | — | — | US | disclosed |
| US-7162955-B2 | Lithographic printing method and printing press | FUJI PHOTO FILM CO., LTD. (JP) | 2007-01-16 | — | — | US | disclosed |
| US-20070003871-A1 | Positive photosensitive composition | FUJI PHOTO FILM CO., LTD. | 2007-01-04 | — | — | US | disclosed |
| US-20070003871-A1 | Positive photosensitive composition | FUJI PHOTO FILM CO., LTD. | 2007-01-04 | — | — | US | disclosed |
| US-5171655-A | Acrylic esters or amides containing pendant maleimide groups; photoresists; short exposure times using scanning laser rays; workability | FUJI PHOTO FILM CO., LTD. (JP) | 1992-12-15 | — | — | US | disclosed |
| US-4950582-A | CONTAINING POLYURETHANE CONTAINING N-AMINOSULFONYLAMIDO GROUP | FUJI PHOTO FILM CO., LTD. (JP) | 1990-08-21 | — | — | US | disclosed |
| US-4877711-A | DURABLE PRINTING PLATES | FUJI PHOTO FILM CO., LTD. (JP) | 1989-10-31 | — | — | US | disclosed |