SCHEMBL195951

SCHEMBL195951

C=C(COCC(C(=O)O)=C(C12CC3CC(CC(C3)C1)C2)C12CC3CC(CC(C3)C1)C2)C(=O)O

nearest known ligand 0.34

Predicted protein targets (top 17)

geneUniProtsupporting neighboursconfidence
GLA P06280 1/20 0.34
ALDH1A1 P00352 3/20 0.34
MEN1 O00255 1/20 0.34
MAPT P10636 1/20 0.34
KMT2A Q03164 1/20 0.34
NPSR1 Q6W5P4 1/20 0.34
ITGB1 P05556 2/20 0.33
ITGA4 P13612 2/20 0.33
KDM4E B2RXH2 1/20 0.33
HTT P42858 1/20 0.33
LMNA P02545 2/20 0.32
HSP90AA1 P07900 1/20 0.32
HSD11B1 P28845 3/20 0.32
PRKCA P17252 1/20 0.31
TSHR P16473 1/20 0.31
HPGD P15428 1/20 0.31
RECQL P46063 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL4614480 0.80
SCHEMBL195646 0.78
SCHEMBL17830226 0.74 ALDH1A1 (0.55) ALDH1A1MEN1MAPTKMT2ANPSR1
SCHEMBL6902701 0.70 ALDH1A1 (0.35) GLAALDH1A1MEN1MAPTKMT2A
SCHEMBL351637 0.70 TET2 (0.40) TSHR
SCHEMBL195104 0.68 GRIK1 (0.35)
SCHEMBL195308 0.67
SCHEMBL31681090 0.66 CYP19A1 (0.39) ALDH1A1MEN1MAPTKMT2ANPSR1
SCHEMBL195078 0.65 GRIK1 (0.39)
SCHEMBL3369268 0.65 ALDH1A1 (0.40) GLAALDH1A1MEN1KMT2ANPSR1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 149 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2024203854-A1 METHOD FOR STORING ETHER GROUP-CONTAINING POLYVALENT UNSATURATED COMPOUND COMPOSITION, ETHER GROUP-CONTAINING POLYVALENT UNSATURATED COMPOUND COMPOSITION, MONOMER COMPOSITION, TETRAHYDROPYRAN RING POLYMER, PHOTOSENSITIVE RESIN COMPOSITION, CURED PRODUCT, MEMBER FOR DISPLAY DEVICE, AND METHOD FOR PRODUCING SAME 株式会社日本触媒 2024-10-03 WO disclosed
US-20240287231-A1 CURABLE RESIN COMPOSITION AND METHOD OF MANUFACTURING ARTICLE CANON KK (JP) 2024-08-29 US disclosed
US-11987658-B2 Curable resin composition and method of manufacturing article CANON KABUSHIKI KAISHA (JP) 2024-05-21 US disclosed
US-20230031949-A1 DISPLAY DEVICE SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2023-02-02 US disclosed
EP-3042934-B1 COLORED COMPOSITION, CURED FILM, COLOR FILTER, COLOR-FILTER MANUFACTURING METHOD, SOLID-STATE IMAGING ELEMENT, IMAGE DISPLAY DEVICE, POLYMER, AND XANTHENE DYE FUJIFILM CORP (JP) 2022-11-09 EP disclosed
EP-4083707-A1 DISPLAY DEVICE SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2022-11-02 EP disclosed
US-20220282013-A1 CURABLE RESIN COMPOSITION AND METHOD OF MANUFACTURING ARTICLE CANON KABUSHIKI KAISHA (JP) 2022-09-08 US disclosed
EP-2553025-B1 COLORED COMPOSITION, INKJET INK, COLOR FILTER AND METHOD OF PRODUCING THE SAME, SOLID-STATE IMAGE SENSOR AND DISPLAY DEVICE FUJIFILM CORP (JP) 2022-01-12 EP disclosed
US-20200096864-A1 FILM, COLOR FILTER, SOLID IMAGE PICKUP ELEMENT, AND INFRARED SENSOR FUJIFILM CORPORATION (JP) 2020-03-26 US disclosed
US-10578966-B2 Coloring composition, film, color filter, pattern forming method, method of manufacturing color filter, solid image pickup element, and infrared sensor FUJIFILM CORPORATION (JP) 2020-03-03 US disclosed
EP-2230269-A2 Colored curable composition, color filter, and method for producing color filter FUJIFILM Corporation (JP) 2010-09-22 EP disclosed
EP-1304340-B1 RESINS FOR RESISTS AND CHEMICALLY AMPLIFIABLE RESIST COMPOSITIONS MITSUBISHI RAYON CO (JP) 2008-10-29 EP disclosed
US-20080241713-A1 COLORED PHOTOCURABLE COMPOSITION FOR SOLID STATE IMAGE PICK-UP DEVICE, COLOR FILTER AND METHOD FOR PRODUCTION THEREOF, AND SOLID STATE IMAGE PICK-UP DEVICE FUJIFILM CORPORATION (JP) 2008-10-02 US disclosed
EP-1975702-A2 Colored photocurable composition for solid state image pick-up device, color filter and method for production thereof, and solid state image pick-up device Fujifilm Corporation (JP) 2008-10-01 EP disclosed
US-6927011-B2 Resins for resists and chemically amplifiable resist compositions MITSUBISHI RAYON CO., LTD. (JP) 2005-08-09 US disclosed
US-20030148214-A1 Resins for resists and chemically amplifiable resist compositions MITSUBISHI CHEMICAL CORPORATION (JP) 2003-08-07 US disclosed
EP-1304340-A1 RESINS FOR RESISTS AND CHEMICALLY AMPLIFIABLE RESIST COMPOSITIONS Mitsubishi Rayon Co., Ltd. (JP) 2003-04-23 EP disclosed
EP-0936227-B1 LOWLY BIREFRINGENT POLYMER, PROCESS FOR THE PRODUCTION THEREOF, AND OPTICAL PICKUP LENS MITSUBISHI RAYON CO (JP) 2002-07-31 EP disclosed
US-6262214-B1 TRANSPARENCY, HEAT-RESISTANCE AND MECHANICAL STRENGTH; USED TO MAKE LENSES, OPTICAL DISKS, OPTICAL FIBERS MITSUBISHI RAYON CO., LTD. (JP) 2001-07-17 US disclosed
EP-0936227-A1 LOWLY BIREFRINGENT POLYMER, PROCESS FOR THE PRODUCTION THEREOF, AND OPTICAL PICKUP LENS MITSUBISHI RAYON CO., LTD. (JP) 1999-08-18 EP disclosed