⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL195951 | 0.80 | GLA (0.34) | — | |
| SCHEMBL195646 | 0.74 | — | — | |
| SCHEMBL1902323 | 0.72 | MAPT (0.32) | — | |
| SCHEMBL2832307 | 0.68 | ALDH1A1 (0.34) | — | |
| SCHEMBL1088728 | 0.68 | THRB (0.35) | — | |
| SCHEMBL4614483 | 0.68 | — | — | |
| SCHEMBL7635407 | 0.66 | EPHX1 (0.38) | — | |
| Methacrylic Acid SCHEMBL27952368 | 0.65 | MAPT (0.31) | — | |
| SCHEMBL195104 | 0.65 | GRIK1 (0.35) | — | |
| SCHEMBL5969631 | 0.65 | EPHX1 (0.35) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-1304340-B1 | RESINS FOR RESISTS AND CHEMICALLY AMPLIFIABLE RESIST COMPOSITIONS | MITSUBISHI RAYON CO (JP) | 2008-10-29 | — | — | EP | disclosed |
| US-6927011-B2 | Resins for resists and chemically amplifiable resist compositions | MITSUBISHI RAYON CO., LTD. (JP) | 2005-08-09 | — | — | US | disclosed |
| US-20030148214-A1 | Resins for resists and chemically amplifiable resist compositions | MITSUBISHI CHEMICAL CORPORATION (JP) | 2003-08-07 | — | — | US | disclosed |
| EP-1304340-A1 | RESINS FOR RESISTS AND CHEMICALLY AMPLIFIABLE RESIST COMPOSITIONS | Mitsubishi Rayon Co., Ltd. (JP) | 2003-04-23 | — | — | EP | disclosed |