SCHEMBL19601044

SCHEMBL19601044

CC(F)(F)COC(=O)C12CC3CC(C1)C1(CCC(F)(F)C(F)(F)CC1)C(C3)C2

nearest known ligand 0.39

Predicted protein targets (top 18)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 5/20 0.35
MEN1 O00255 2/20 0.35
KMT2A Q03164 2/20 0.35
NPSR1 Q6W5P4 2/20 0.35
MAPT P10636 2/20 0.35
PRKCA P17252 1/20 0.34
PKM P14618 1/20 0.33
ATM Q13315 1/20 0.33
CYP17A1 P05093 3/20 0.33
CYP19A1 P11511 3/20 0.33
SCN1A P35498 1/20 0.32
SCN2A Q99250 1/20 0.32
SCN3A Q9NY46 1/20 0.32
KDM4E B2RXH2 1/20 0.31
POLB P06746 1/20 0.30
GAA P10253 1/20 0.30
TSHR P16473 1/20 0.30
MAPK1 P28482 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL19607150 0.84 PKM (0.34) ALDH1A1MEN1KMT2ANPSR1MAPT
SCHEMBL26792338 0.84 ALDH1A1 (0.32) ALDH1A1MEN1KMT2ANPSR1MAPT
SCHEMBL2601744 0.82 ALDH1A1 (0.47) ALDH1A1MEN1KMT2ANPSR1MAPT
SCHEMBL686309 0.82 ALDH1A1 (0.40) ALDH1A1MEN1KMT2ANPSR1MAPT
SCHEMBL17279355 0.81 ALDH1A1 (0.37) ALDH1A1MEN1KMT2ANPSR1MAPT
SCHEMBL686184 0.80 ALDH1A1 (0.36) ALDH1A1MEN1KMT2ANPSR1MAPT
SCHEMBL17279353 0.79 ALDH1A1 (0.37) ALDH1A1MEN1KMT2ANPSR1MAPT
SCHEMBL12932552 0.79 ALDH1A1 (0.38) ALDH1A1MEN1KMT2ANPSR1MAPT
SCHEMBL685926 0.78 ALDH1A1 (0.35) ALDH1A1MEN1KMT2ANPSR1MAPT
SCHEMBL685296 0.77 PRKCA (0.36) ALDH1A1MEN1KMT2ANPSR1MAPT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20230161256-A1 SALT, ACID GENERATOR, RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2023-05-25 US disclosed
US-20170329223-A1 PHOTORESIST COMPOSITION SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2017-11-16 US disclosed