SCHEMBL19601192

SCHEMBL19601192

CCC(Cc1ccc(C(=O)N2CCN(C(=O)c3ccc(CC(CCNI)(C(=O)c4ccc(N5CCNCC5)cc4)N(C)C)cc3)CC2)cc1)(C(=O)c1ccc(N2CCNCC2)cc1)N(C)C

nearest known ligand 0.37

Predicted protein targets (top 19)

geneUniProtsupporting neighboursconfidence
LMNA P02545 5/20 0.37
HTT P42858 2/20 0.37
SMN1; SMN2 Q16637 2/20 0.37
GAA P10253 1/20 0.37
KMT2A Q03164 3/20 0.36
MAPKAPK2 P49137 3/20 0.36
HPGD P15428 1/20 0.36
ALDH1A1 P00352 4/20 0.35
CHRNA10 Q9GZZ6 1/20 0.35
CHRNA9 Q9UGM1 1/20 0.35
USP2 O75604 1/20 0.35
TSHR P16473 1/20 0.35
HSD17B10 Q99714 1/20 0.35
HSP90AA1 P07900 1/20 0.35
MAPT P10636 2/20 0.35
DCTPP1 Q9H773 1/20 0.35
LSS P48449 1/20 0.34
MEN1 O00255 1/20 0.34
KDM4E B2RXH2 1/20 0.34

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL19601159 0.92 LMNA (0.43) LMNAHTTSMN1; SMN2GAAKMT2A
SCHEMBL19601364 0.90 LMNA (0.40) LMNAHTTSMN1; SMN2GAAKMT2A
SCHEMBL17269404 0.90 HPGD (0.44) LMNAHTTSMN1; SMN2GAAKMT2A
SCHEMBL21480958 0.88 HRH3 (0.43) LMNAHTTSMN1; SMN2GAAKMT2A
SCHEMBL17269417 0.87 CHRNA10 (0.46) LMNAHTTSMN1; SMN2GAAKMT2A
SCHEMBL2704646 0.87 ALDH1A1 (0.45) LMNASMN1; SMN2MAPKAPK2ALDH1A1USP2
SCHEMBL17269400 0.86 HPGD (0.43) LMNAHTTSMN1; SMN2KMT2AMAPKAPK2
SCHEMBL19601176 0.85 LMNA (0.39) LMNAHTTSMN1; SMN2GAAKMT2A
SCHEMBL17269381 0.84 SMN1; SMN2 (0.42) LMNAHTTSMN1; SMN2KMT2AHPGD
SCHEMBL20988009 0.83 CHRNA10 (0.42) HTTSMN1; SMN2MAPKAPK2ALDH1A1CHRNA10

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2017195428-A1 NOVEL COMPOUND, PHOTOCURABLE COMPOSITION, CURED PRODUCT THEREOF, PRINTING INK, AND PRINTED MATTER USING PRINTING INK DIC株式会社 2017-11-16 WO disclosed