SCHEMBL19628845

SCHEMBL19628845

CC(C)(OC#N)C1CCCC(C(C)(C)OC#N)C1

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL17299363 0.94
SCHEMBL9219149 0.70 ALDH1A1 (0.32)
SCHEMBL9019695 0.65 EPHX1 (0.32)
SCHEMBL4669972 0.64
SCHEMBL12691727 0.63
SCHEMBL1028162 0.62 ALDH1A1 (0.30)
SCHEMBL5712546 0.61
SCHEMBL12384564 0.61
SCHEMBL21961179 0.61
SCHEMBL4639835 0.61 TRPA1 (0.39)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 13 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11839700-B2 Bio-electrode composition, bio-electrode, and method for manufacturing a bio-electrode SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-12-12 US disclosed
EP-2949676-B1 NON-HOT-MELT MDI-BASED POLYURETHANE COMPOSITION BEARING NCO END GROUPS AND HAVING A LOW CONTENT OF MDI MONOMER, COMPRISING AT LEAST ONE ISOCYANATE COMPOUND OF PARTICULAR MOLAR VOLUME BOSTIK SA (FR) 2023-02-22 EP disclosed
US-11193003-B2 Stretchable film, method for forming the same, stretchable wiring film, and method for manufacturing the same SHIN-ETSU CHEMICAL CO., LTD. (JP) 2021-12-07 US disclosed
EP-3530682-B1 SILICON-CONTAINING COMPOUND, URETHANE RESIN, STRETCHABLE FILM AND METHOD FOR FORMING THE SAME SHINETSU CHEMICAL CO (JP) 2021-03-31 EP disclosed
US-10544272-B2 Stretchable film and method for forming the same, method for manufacturing coated wiring substrate, and stretchable wiring film and method for manufacturing the same SHIN-ETSU CHEMICAL CO., LTD. (JP) 2020-01-28 US disclosed
EP-3530682-A1 SILICON-CONTAINING COMPOUND, URETHANE RESIN, STRETCHABLE FILM AND METHOD FOR FORMING THE SAME Shin-Etsu Chemical Co., Ltd. (JP) 2019-08-28 EP disclosed
US-20180215876-A1 STRETCHABLE FILM AND METHOD FOR FORMING THE STRETCHABLE FILM SHIN-ETSU CHEMICAL CO., LTD. (JP) 2018-08-02 US disclosed
US-20180134860-A1 STRETCHABLE FILM, METHOD FOR FORMING THE SAME, STRETCHABLE WIRING FILM, AND METHOD FOR MANUFACTURING THE SAME SHIN-ETSU CHEMICAL CO., LTD. (JP) 2018-05-17 US disclosed
US-20180134860-A1 STRETCHABLE FILM, METHOD FOR FORMING THE SAME, STRETCHABLE WIRING FILM, AND METHOD FOR MANUFACTURING THE SAME SHIN-ETSU CHEMICAL CO., LTD. (JP) 2018-05-17 US disclosed
US-20180118915-A1 STRETCHABLE FILM, METHOD FOR FORMING THE SAME, STRETCHABLE WIRING FILM, AND METHOD FOR MANUFACTURING THE SAME SHIN-ETSU CHEMICAL CO., LTD. (JP) 2018-05-03 US disclosed
US-20180118915-A1 STRETCHABLE FILM, METHOD FOR FORMING THE SAME, STRETCHABLE WIRING FILM, AND METHOD FOR MANUFACTURING THE SAME SHIN-ETSU CHEMICAL CO., LTD. (JP) 2018-05-03 US disclosed
US-20170335076-A1 STRETCHABLE FILM AND METHOD FOR FORMING THE SAME, METHOD FOR MANUFACTURING COATED WIRING SUBSTRATE, AND STRETCHABLE WIRING FILM AND METHOD FOR MANUFACTURING THE SAME SHIN-ETSU CHEMICAL CO., LTD. (JP) 2017-11-23 US disclosed
US-20170335076-A1 STRETCHABLE FILM AND METHOD FOR FORMING THE SAME, METHOD FOR MANUFACTURING COATED WIRING SUBSTRATE, AND STRETCHABLE WIRING FILM AND METHOD FOR MANUFACTURING THE SAME SHIN-ETSU CHEMICAL CO., LTD. (JP) 2017-11-23 US disclosed