Predicted protein targets (top 1)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL4669972 | 0.98 | — | — | |
| SCHEMBL5712594 | 0.83 | — | — | |
| SCHEMBL1028910 | 0.80 | — | — | |
| SCHEMBL5712546 | 0.80 | — | — | |
| SCHEMBL2845107 | 0.76 | ALDH1A1 (0.32) | ALDH1A1 | |
| SCHEMBL4673515 | 0.75 | EPHX1 (0.31) | — | |
| SCHEMBL890429 | 0.73 | EPHX1 (0.32) | — | |
| SCHEMBL2846022 | 0.73 | — | — | |
| SCHEMBL4670373 | 0.72 | CYP1A2 (0.31) | — | |
| SCHEMBL4669954 | 0.72 | CYP1A2 (0.30) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 65 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-5811475-A | REACTING A CARBON WITH A POLYMER HAVING A REACTIVE GROUP AND A HYDROLYZABLE TERT-ALKYL ACRYLIC ESTER; PRINTING INKS; DIELECTRICS; HIGH ELECTRICAL RESISTANCE | NIPPON OIL CO., LTD. (JP) | 1998-09-22 | — | — | US | claimed |
| EP-1122606-B1 | Chemically amplified positive resist composition | SUMITOMO CHEMICAL CO (JP) | 2011-01-19 | — | — | EP | disclosed |
| EP-1154321-B1 | Chemical amplification type positive resist compositions and sulfonium salts | SUMITOMO CHEMICAL CO (JP) | 2010-08-25 | — | — | EP | disclosed |
| US-7625689-B2 | better line edge roughness in excimer laser lithography; supramolecule ester useful in photoresists e.g. pentaerythritol, tetrakis(3-(methoxymethyloxycarbonyl)cyclohexanecarboxylate) aka PECHOM and other adamantanyl and norbornyl derivatives | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2009-12-01 | — | — | US | disclosed |
| US-7576223-B2 | Polymer of a (meth)acryloyloxy)ethoxycarbonyl)sulfonium sulfonate, e.g., 1-[2-(2-methylacryloyloxy)ethoxycarbonyl]tetrahydrothiophenium perfluorobutanesulfonate; used a an acid generator in excimer laser lithography; stable fine patterns without collapse and improved line edge roughness. | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2009-08-18 | — | — | US | disclosed |
| US-7470499-B2 | Alicyclic unsaturated compound, polymer, chemically amplified resist composition and method for forming pattern using said composition | NEC CORPORATION (JP) | 2008-12-30 | — | — | US | disclosed |
| US-20080269506-A1 | Chemical amplification type resist composition | YAMADA AIRI | 2008-10-30 | — | — | US | disclosed |
| US-7396899-B2 | Chemical amplification type resist composition | SUMITOMO CHEMICAL CO., LTD. (JP) | 2008-07-08 | — | — | US | disclosed |
| US-20080124552-A1 | Particle With Rough Surface For Plating Or Vapor Deposition | NISSHINBO INDUSTRIES, INC. (JP) | 2008-05-29 | — | — | US | disclosed |
| US-7232639-B2 | Monomer having fluorine-containing acetal or ketal structure, polymer thereof, and chemical-amplification-type resist composition as well as process for formation of pattern with use of the same | NEC CORPORATION (JP) | 2007-06-19 | — | — | US | disclosed |
| US-20010039080-A1 | Chemically amplified positive resist compositon | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2001-11-08 | — | — | US | disclosed |
| EP-1143299-A1 | Chemically amplified positive resist composition | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2001-10-10 | — | — | EP | disclosed |
| EP-1128212-A2 | Chemically amplified positive resist composition | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2001-08-29 | — | — | EP | disclosed |
| EP-1122606-A2 | Chemically amplified positive resist composition | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2001-08-08 | — | — | EP | disclosed |
| EP-1041442-A1 | Chemical amplification type positive resist | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2000-10-04 | — | — | EP | disclosed |
| US-5821277-A | Thermosetting and procuring compositions for color filters and method for making the same | NIPPON OIL CO., LTD. (JP) | 1998-10-13 | — | — | US | disclosed |
| US-5811475-A | REACTING A CARBON WITH A POLYMER HAVING A REACTIVE GROUP AND A HYDROLYZABLE TERT-ALKYL ACRYLIC ESTER; PRINTING INKS; DIELECTRICS; HIGH ELECTRICAL RESISTANCE | NIPPON OIL CO., LTD. (JP) | 1998-09-22 | — | — | US | disclosed |
| EP-0753548-A2 | Method for producing carbonaceous material | NIPPON OIL COMPANY, LIMITED (JP) | 1997-01-15 | — | — | EP | disclosed |
| EP-0082967-B1 | TRACTION FLUID | Optimol-Ölwerke GmbH (DE) | 1987-09-23 | — | — | EP | disclosed |
| EP-0082967-A2 | Traction fluid | Optimol-Ölwerke GmbH (DE) | 1983-07-06 | — | — | EP | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20080269506-A1 | Chemical amplification type resist composition | ASIC1, POLR2B, POLR2A | ALDH1A1 1431/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.