SCHEMBL19636154

SCHEMBL19636154

CCCNC(=O)CCCCNC(=O)SC

nearest known ligand 0.52

Predicted protein targets (top 11)

geneUniProtsupporting neighboursconfidence
CASP2 P42575 1/20 0.52
FAAH O00519 5/20 0.50
NAAA Q02083 1/20 0.49
DNM1 Q05193 2/20 0.47
EPHX2 P34913 3/20 0.46
SLC6A5 Q9Y345 2/20 0.45
MEN1 O00255 1/20 0.45
KMT2A Q03164 1/20 0.45
CNR1 P21554 2/20 0.45
EPHX1 P07099 1/20 0.44
TSHR P16473 1/20 0.42

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL9420168 0.82
SCHEMBL16302656 0.82 FAAH (0.63) CASP2FAAHNAAADNM1EPHX2
SCHEMBL13924359 0.81 CASP2 (0.77) CASP2FAAHNAAADNM1EPHX2
SCHEMBL10784050 0.81 EPHX1 (0.58) CASP2NAAAMEN1KMT2AEPHX1
SCHEMBL19544668 0.79 MEN1 (0.68) CASP2FAAHNAAADNM1EPHX2
SCHEMBL10963060 0.79 EPHX1 (0.61) CASP2NAAAEPHX2EPHX1
SCHEMBL5277980 0.78 CASP2 (0.79) CASP2FAAHNAAADNM1EPHX2
SCHEMBL3349108 0.78 FAAH (0.70) CASP2FAAHNAAADNM1EPHX2
SCHEMBL24253267 0.77 CASP2 (0.65) CASP2FAAHNAAADNM1EPHX2
SCHEMBL20542645 0.77 CASP2 (0.83) CASP2FAAHNAAADNM1EPHX2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-10544272-B2 Stretchable film and method for forming the same, method for manufacturing coated wiring substrate, and stretchable wiring film and method for manufacturing the same SHIN-ETSU CHEMICAL CO., LTD. (JP) 2020-01-28 US disclosed
US-20170335076-A1 STRETCHABLE FILM AND METHOD FOR FORMING THE SAME, METHOD FOR MANUFACTURING COATED WIRING SUBSTRATE, AND STRETCHABLE WIRING FILM AND METHOD FOR MANUFACTURING THE SAME SHIN-ETSU CHEMICAL CO., LTD. (JP) 2017-11-23 US disclosed