SCHEMBL19640356

SCHEMBL19640356

C=C(CC(C)Oc1ccccc1)C(=O)O.CCOC(Oc1ccccc1)=C(CC)C(=O)O

nearest known ligand 0.38

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
MTNR1A P48039 1/20 0.38
MTNR1B P49286 1/20 0.38
LMNA P02545 2/20 0.36
L3MBTL1 Q9Y468 1/20 0.36
ALDH1A1 P00352 4/20 0.36
TDP1 Q9NUW8 2/20 0.36
TSHR P16473 1/20 0.36
MAPK1 P28482 1/20 0.36
MAPT P10636 3/20 0.36
NPC1 O15118 3/20 0.34
RAB9A P51151 2/20 0.34
MEN1 O00255 3/20 0.33
KMT2A Q03164 3/20 0.33
TP53 P04637 1/20 0.33
GAA P10253 1/20 0.33
NPSR1 Q6W5P4 1/20 0.33
SMN1; SMN2 Q16637 1/20 0.32
LTB4R Q15722 1/20 0.32
LTB4R2 Q9NPC1 1/20 0.32
CASP1 P29466 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL124445 0.83 MAPT (0.48) L3MBTL1TDP1TSHRMAPK1MAPT
SCHEMBL12520336 0.81 MTNR1A (0.53) MTNR1AMTNR1BLMNAL3MBTL1ALDH1A1
SCHEMBL18422860 0.73 MAPT (0.42) L3MBTL1ALDH1A1TDP1TSHRMAPK1
SCHEMBL10334448 0.72 MTNR1A (0.51) MTNR1AMTNR1BLMNAL3MBTL1ALDH1A1
SCHEMBL18422903 0.70 THRB (0.42) L3MBTL1ALDH1A1TDP1TSHRMAPK1
SCHEMBL28134481 0.69 MTNR1A (0.53) MTNR1AMTNR1BLMNAALDH1A1TDP1
SCHEMBL10892655 0.69 MAPT (0.43) ALDH1A1TDP1TSHRMAPK1MAPT
SCHEMBL9487571 0.68 MAPT (0.50) L3MBTL1ALDH1A1TDP1TSHRMAPK1
SCHEMBL691181 0.68 MTNR1A (0.38) MTNR1AMTNR1BLMNAL3MBTL1ALDH1A1
SCHEMBL446021 0.68 MTNR1A (0.50) MTNR1AMTNR1BLMNAALDH1A1MAPT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-10253156-B2 Process for producing dispersion of fine inorganic particles, curable composition containing said dispersion, and cured object obtained therefrom DIC CORPORATION (JP) 2019-04-09 US disclosed
US-20170342234-A1 PROCESS FOR PRODUCING DISPERSION OF FINE INORGANIC PARTICLES, CURABLE COMPOSITION CONTAINING SAID DISPERSION, AND CURED OBJECT OBTAINED THEREFROM DIC CORPORATION (JP) 2017-11-30 US disclosed