Predicted protein targets (top 9)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.39 |
| ▸ | F2 | P00734 | 1/20 | 0.35 |
| ▸ | ELANE | P08246 | 1/20 | 0.35 |
| ▸ | CTSG | P08311 | 1/20 | 0.35 |
| ▸ | CTRC | Q99895 | 1/20 | 0.35 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.31 |
| ▸ | THRB | P10828 | 1/20 | 0.31 |
| ▸ | MEN1 | O00255 | 1/20 | 0.31 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL13241897 | 0.83 | — | — | |
| SCHEMBL7885217 | 0.81 | KMT2A (0.32) | KMT2A | |
| SCHEMBL9930180 | 0.80 | — | — | |
| SCHEMBL4344570 | 0.79 | TP53 (0.37) | L3MBTL1ALDH1A1THRB | |
| SCHEMBL11337118 | 0.77 | KMT2A (0.43) | ALDH1A1KMT2A | |
| SCHEMBL4360274 | 0.76 | L3MBTL1 (0.32) | L3MBTL1 | |
| SCHEMBL9815040 | 0.74 | L3MBTL1 (0.40) | L3MBTL1F2ELANECTSGCTRC | |
| SCHEMBL13241900 | 0.74 | GAA (0.33) | F2ELANECTSGCTRC | |
| SCHEMBL3795571 | 0.73 | — | — | |
| SCHEMBL4359074 | 0.72 | CYP3A4 (0.37) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 67 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20250075051-A1 | PROCESS FOR RECYCLING CONTAMINATED POLYMERS | ARKEMA FRANCE (FR) | 2025-03-06 | — | — | US | claimed |
| EP-4457275-A1 | PROCESS FOR RECYCLING CONTAMINATED POLYMERS | ARKEMA FRANCE (FR) | 2024-11-06 | — | — | EP | claimed |
| WO-2023126441-A1 | PROCESS FOR RECYCLING CONTAMINATED POLYMERS | ARKEMA FRANCE (FR) | 2023-07-06 | — | — | WO | claimed |
| EP-4206267-A1 | PROCESS FOR RECYCLING CONTAMINATED POLYMERS | ARKEMA FRANCE (FR) | 2023-07-05 | — | — | EP | claimed |
| US-20080187735-A1 | Non-Woven Fabric and Food Casing Which is Produced Therefrom and Which is Based on Cellulose Hydrate | KALLE GMBH (DE) | 2008-08-07 | — | — | US | claimed |
| US-20250075051-A1 | PROCESS FOR RECYCLING CONTAMINATED POLYMERS | ARKEMA FRANCE (FR) | 2025-03-06 | — | — | US | disclosed |
| EP-4457275-A1 | PROCESS FOR RECYCLING CONTAMINATED POLYMERS | ARKEMA FRANCE (FR) | 2024-11-06 | — | — | EP | disclosed |
| CN-118444528-A | Photosensitive coloring resin composition, cured product, coloring spacer and image display device | 三菱化学株式会社 | 2024-08-06 | — | — | CN | disclosed |
| CN-113168094-B | Photosensitive coloring resin composition, cured product, coloring spacer and image display device | 三菱化学株式会社 | 2024-06-11 | — | — | CN | disclosed |
| CN-118151488-A | Colored photosensitive resin composition, pigment dispersion liquid, partition wall, organic electroluminescent element, image display device, and illumination | 三菱化学株式会社 | 2024-06-07 | — | — | CN | disclosed |
| CN-111190328-B | Photosensitive coloring composition, black matrix, coloring spacer, image display device, and pigment dispersion | 三菱化学株式会社 | 2024-05-24 | — | — | CN | disclosed |
| CN-114774031-B | Adhesive and polarizing plate comprising same | 住华科技股份有限公司 | 2023-08-18 | — | — | CN | disclosed |
| WO-2005052016-A2 | BOTTOM ANTIREFLECTIVE COATINGS | AZ ELECTRONIC MATERIALS USA CORP. (DE) | 2005-06-09 | — | — | WO | disclosed |
| US-20050112494-A1 | Bottom antireflective coatings | AZ ELECTRONIC MATERIALS USA CORP. | 2005-05-26 | — | — | US | disclosed |
| US-6645693-B2 | Radiation sensitivity | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2003-11-11 | — | — | US | disclosed |
| US-6569596-B1 | Photoresists comprising N-(ethylsulfonyloxy)succinimide, novolaks, curing agents and an acid generators such as alpha -(hexylsulfonyloxyimino)-4-methoxybenzyl cyanide; integrated circuits; semiconductors | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2003-05-27 | — | — | US | disclosed |
| US-20020031718-A1 | Resist composition | SUMITOMO CHEMICAL COMPANY, LIMITED | 2002-03-14 | — | — | US | disclosed |
| US-6245478-B1 | Resist composition | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2001-06-12 | — | — | US | disclosed |
| EP-0917000-A2 | Positive resist composition and method for forming a resist pattern | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 1999-05-19 | — | — | EP | disclosed |
| US-4017259-A | TERT-AMINO-N-METHYLOL, DURABLE PRESS | THE UNITED STATES OF AMERICA AS REPRESENTED BY THE SECRETARY OF AGRICULTURE (US) | 1977-04-12 | — | — | US | disclosed |