⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL9930180 | 0.75 | — | — | |
| SCHEMBL133648 | 0.75 | CYP2D6 (0.36) | — | |
| SCHEMBL472276 | 0.70 | TSHR (0.35) | — | |
| SCHEMBL6159312 | 0.68 | KMT2A (0.33) | — | |
| SCHEMBL13241897 | 0.68 | — | — | |
| SCHEMBL3795571 | 0.68 | — | — | |
| SCHEMBL7885217 | 0.67 | KMT2A (0.32) | — | |
| SCHEMBL5032943 | 0.67 | APEX1 (0.39) | — | |
| SCHEMBL4360274 | 0.67 | L3MBTL1 (0.32) | — | |
| SCHEMBL15926439 | 0.66 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 68 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20250075051-A1 | PROCESS FOR RECYCLING CONTAMINATED POLYMERS | ARKEMA FRANCE (FR) | 2025-03-06 | — | — | US | claimed |
| EP-4457275-A1 | PROCESS FOR RECYCLING CONTAMINATED POLYMERS | ARKEMA FRANCE (FR) | 2024-11-06 | — | — | EP | claimed |
| WO-2023126441-A1 | PROCESS FOR RECYCLING CONTAMINATED POLYMERS | ARKEMA FRANCE (FR) | 2023-07-06 | — | — | WO | claimed |
| EP-4206267-A1 | PROCESS FOR RECYCLING CONTAMINATED POLYMERS | ARKEMA FRANCE (FR) | 2023-07-05 | — | — | EP | claimed |
| US-20250075051-A1 | PROCESS FOR RECYCLING CONTAMINATED POLYMERS | ARKEMA FRANCE (FR) | 2025-03-06 | — | — | US | disclosed |
| EP-4457275-A1 | PROCESS FOR RECYCLING CONTAMINATED POLYMERS | ARKEMA FRANCE (FR) | 2024-11-06 | — | — | EP | disclosed |
| CN-114774031-B | Adhesive and polarizing plate comprising same | 住华科技股份有限公司 | 2023-08-18 | — | — | CN | disclosed |
| WO-2023126441-A1 | PROCESS FOR RECYCLING CONTAMINATED POLYMERS | ARKEMA FRANCE (FR) | 2023-07-06 | — | — | WO | disclosed |
| EP-4206267-A1 | PROCESS FOR RECYCLING CONTAMINATED POLYMERS | ARKEMA FRANCE (FR) | 2023-07-05 | — | — | EP | disclosed |
| CN-114774031-A | Adhesive and polarizing plate comprising same | 住华科技股份有限公司 | 2022-07-22 | — | — | CN | disclosed |
| CN-111183254-A | Antifouling fiber structure | 东丽株式会社 | 2020-05-19 | — | — | CN | disclosed |
| US-20180345209-A1 | SCAVENGERS | HEXION INC. | 2018-12-06 | — | — | US | disclosed |
| US-20050112494-A1 | Bottom antireflective coatings | AZ ELECTRONIC MATERIALS USA CORP. | 2005-05-26 | — | — | US | disclosed |
| US-6645693-B2 | Radiation sensitivity | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2003-11-11 | — | — | US | disclosed |
| US-6569596-B1 | Photoresists comprising N-(ethylsulfonyloxy)succinimide, novolaks, curing agents and an acid generators such as alpha -(hexylsulfonyloxyimino)-4-methoxybenzyl cyanide; integrated circuits; semiconductors | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2003-05-27 | — | — | US | disclosed |
| US-20020031718-A1 | Resist composition | SUMITOMO CHEMICAL COMPANY, LIMITED | 2002-03-14 | — | — | US | disclosed |
| US-6245478-B1 | Resist composition | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2001-06-12 | — | — | US | disclosed |
| EP-0917000-A2 | Positive resist composition and method for forming a resist pattern | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 1999-05-19 | — | — | EP | disclosed |
| US-4356199-A | Tubular packaging material and method for its manufacture | HOECHST AKTIENGESELLSCHAFT (DE) | 1982-10-26 | — | — | US | disclosed |
| US-4356200-A | Tubular packaging material and method for its manufacture | HOECHST AKTIENGESELLSCHAFT (DE) | 1982-10-26 | — | — | US | disclosed |