SCHEMBL5032943

SCHEMBL5032943

O=C1N(CO)CC(O)CN1CO

nearest known ligand 0.39

Predicted protein targets (top 5)

geneUniProtsupporting neighboursconfidence
APEX1 P27695 1/20 0.39
BLM P54132 1/20 0.39
L3MBTL1 Q9Y468 1/20 0.32
PDK1 Q15118 1/20 0.31
BRD4 O60885 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1020051 0.75 L3MBTL1 (0.38) L3MBTL1
SCHEMBL16597273 0.73 APEX1 (0.35) APEX1BLMBRD4
SCHEMBL133648 0.73 CYP2D6 (0.36) L3MBTL1
SCHEMBL9930180 0.73
SCHEMBL472276 0.69 TSHR (0.35) L3MBTL1
SCHEMBL313704 0.69 L3MBTL1 (0.41) L3MBTL1BRD4
SCHEMBL5573227 0.69 L3MBTL1 (0.36) L3MBTL1BRD4
SCHEMBL3795571 0.67
SCHEMBL196670 0.67
SCHEMBL6159312 0.67 KMT2A (0.33)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 8 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20080187735-A1 Non-Woven Fabric and Food Casing Which is Produced Therefrom and Which is Based on Cellulose Hydrate KALLE GMBH (DE) 2008-08-07 US claimed
US-10324374-B2 Active light sensitive or radiation sensitive resin composition, active light sensitive or radiation sensitive film, mask blank provided with active light sensitive or radiation sensitive film, pattern forming method, method for manufacturing electronic device, electronic device and novel compound FUJIFILM CORPORATION (JP) 2019-06-18 US disclosed
US-20160209746-A1 ACTIVE LIGHT SENSITIVE OR RADIATION SENSITIVE RESIN COMPOSITION, ACTIVE LIGHT SENSITIVE OR RADIATION SENSITIVE FILM, MASK BLANK PROVIDED WITH ACTIVE LIGHT SENSITIVE OR RADIATION SENSITIVE FILM, PATTERN FORMING METHOD, METHOD FOR MANUFACTURING ELECTRONIC DEVICE, ELECTRONIC DEVICE AND NOVEL COMPOUND FUJIFILM CORPORATION (JP) 2016-07-21 US disclosed
US-20160209746-A1 ACTIVE LIGHT SENSITIVE OR RADIATION SENSITIVE RESIN COMPOSITION, ACTIVE LIGHT SENSITIVE OR RADIATION SENSITIVE FILM, MASK BLANK PROVIDED WITH ACTIVE LIGHT SENSITIVE OR RADIATION SENSITIVE FILM, PATTERN FORMING METHOD, METHOD FOR MANUFACTURING ELECTRONIC DEVICE, ELECTRONIC DEVICE AND NOVEL COMPOUND FUJIFILM CORPORATION (JP) 2016-07-21 US disclosed
EP-1811852-A1 NON-WOVEN FABRIC AND FOOD CASING WHICH IS PRODUCED THEREFROM AND WHICH IS BASED ON CELLULOSE HYDRATE Kalle GmbH (DE) 2007-08-01 EP disclosed
WO-2006048235-A1 NON-WOVEN FABRIC AND FOOD CASING WHICH IS PRODUCED THEREFROM AND WHICH IS BASED ON CELLULOSE HYDRATE KALLE GMBH (DE) 2006-05-11 WO disclosed
US-6469197-B1 A (METH)ACRYLATE DERIVATIVE WHOSE ESTER PORTION IS A 4,7-METHANOINDENE DIOL OR 1,4:5,8-DIMETHANONAPHTHALENE DIOL FOR MAKING PHOTORESIST POLYMERS NEC CORPORATION (JP) 2002-10-22 US disclosed
US-6146806-A Negative photoresist composition using polymer having 1,2-diol structure and process for forming pattern using the same NEC CORPORATION (JP) 2000-11-14 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20160209746-A1 ACTIVE LIGHT SENSITIVE OR RADIATION SENSITIVE RESIN COMPOSITION, ACTIVE LIGHT SENSITIVE OR RADIATION SENSITIVE FILM, MASK BLANK PROVIDED WITH ACTIVE LIGHT SENSITIVE OR RADIATION SENSITIVE FILM, PATTERN FORMING METHOD, METHOD FOR MANUFACTURING ELECTRONIC DEVICE, ELECTRONIC DEVICE AND NOVEL COMPOUND ERCC1, RER1, ECPAS APEX1 371/4885BLM 42/4885L3MBTL1 3594/4885
US-10324374-B2 Active light sensitive or radiation sensitive resin composition, active light sensitive or radiation sensitive film, mask blank provided with active light sensitive or radiation sensitive film, pattern forming method, method for manufacturing electronic device, electronic device and novel compound ERCC1, RER1, ECPAS APEX1 371/4885BLM 42/4885L3MBTL1 3594/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.