SCHEMBL196680

SCHEMBL196680

O=CN1C(=O)NC2NC(=O)NC21

nearest known ligand 0.46

Predicted protein targets (top 8)

geneUniProtsupporting neighboursconfidence
MAPT P10636 1/20 0.46
TDP1 Q9NUW8 3/20 0.42
ABL1 P00519 2/20 0.42
RIN1 Q13671 2/20 0.42
KDM4E B2RXH2 3/20 0.35
KMT2A Q03164 1/20 0.34
HTT P42858 2/20 0.31
GAA P10253 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL5500844 0.68 MAPT (0.48) MAPTTDP1ABL1RIN1KDM4E
SCHEMBL11072577 0.67 GAA (0.47) TDP1ABL1RIN1GAA
SCHEMBL11145933 0.67 TDP1 (0.72) MAPTTDP1ABL1RIN1KDM4E
SCHEMBL924239 0.64 TDP1 (0.58) MAPTTDP1ABL1RIN1KDM4E
SCHEMBL192058 0.64 TDP1 (0.68) MAPTTDP1ABL1RIN1KDM4E
SCHEMBL18106267 0.64 TDP1 (0.58) MAPTTDP1ABL1RIN1KDM4E
SCHEMBL4712146 0.64 MAPT (0.44) MAPTTDP1ABL1RIN1KDM4E
SCHEMBL36250 0.63 MAPT (0.39) MAPTTDP1ABL1RIN1
SCHEMBL16859574 0.61 OPRM1 (0.44) MAPTTDP1ABL1RIN1KDM4E
SCHEMBL18106282 0.61 TDP1 (0.64) MAPTTDP1ABL1RIN1KDM4E

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1492 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20250364271-A1 DENSE REDISTRIBUTION LAYERS IN SEMICONDUCTOR PACKAGES AND METHODS OF FORMING THE SAME TAIWAN SEMICONDUCTOR MFG CO LTD (TW) 2025-11-27 US claimed
US-20250344897-A1 EXTRACTION PROCESS ACTEGA RHENANIA GMBH (DE) 2025-11-13 US claimed
US-12469718-B2 Dense redistribution layers in semiconductor packages and methods of forming the same TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. (TW) 2025-11-11 US claimed
EP-4539712-A1 EXTRACTION PROCESS ACTEGA Rhenania GmbH (DE) 2025-04-23 EP claimed
WO-2023241929-A1 EXTRACTION PROCESS ACTEGA RHENANIA GMBH (DE) 2023-12-21 WO claimed
US-11767435-B2 Anti-reflection coating composition and use thereof PHICHEM CORPORATION (CN) 2023-09-26 US claimed
US-20230203319-A1 ANTI-REFLECTION COATING COMPOSITION AND USE THEREOF PHICHEM CORPORATION (CN) 2023-06-29 US claimed
US-20220352086-A1 Dense Redistribution Layers in Semiconductor Packages and Methods of Forming the Same TAIWAN SEMICONDUCTOR MFG CO LTD (TW) 2022-11-03 US claimed
CN-112680052-B Anti-reflective coating composition and application thereof 上海飞凯材料科技股份有限公司 2022-06-28 CN claimed
US-20210139737-A1 AQUEOUS COATING COMPOSITION FOR SIDE SEAM STRIP OR SIDE SEAM COATING ON THREE-PIECE CAN GUANGDONG HUARUN PAINTS CO. LTD. (CN) 2021-05-13 US claimed
EP-0262249-A1 Alcohol control of lightly crosslinked foamed polymer production THE DOW CHEMICAL COMPANY (US) 1988-04-06 EP claimed
US-4694025-A REVERSIBLE GAS-YIELDING CROSS LINKING REACTION PRIOR TO EXTRUSION FOAMING THE DOW CHEMICAL COMPANY (US) 1987-09-15 US claimed
US-4631320-A FORMED FROM POLYDROXYALKYL CARBAMATE WITH ITSELF, ALCOHOL, OR POLYAMINE AMERICAN CYANAMID COMPANY (US) 1986-12-23 US claimed
US-4619999-A Aliphatic isocyanate compounds AMERICAN CYANAMID COMPANY (US) 1986-10-28 US claimed
EP-0195660-A2 High solids coating compositions VALSPAR CORPORATION (US) 1986-09-24 EP claimed
US-4596843-A High solids coating compositions INSILCO CORPORATION (US) 1986-06-24 US claimed
US-4520167-A POLYMER AND AMIDE-ALDEHYDE CROSSLINKER AMERICAN CYANAMID CO. (US) 1985-05-28 US claimed
EP-0120193-A1 Aliphatic isocyanate compounds AMERICAN CYANAMID COMPANY (US) 1984-10-03 EP claimed
EP-0117691-A2 Flexible polyurethane foams with flame and ember drip retardance STAUFFER CHEMICAL COMPANY (US) 1984-09-05 EP claimed
US-4458036-A AND HALOGENATED ORGANIC COMPOUND STAUFFER CHEMICAL COMPANY (US) 1984-07-03 US claimed