Known targets — ChEMBL curated mechanism
ACEADRA1AADRA1BADRA1DADRA2AADRA2BADRA2CADRB1ADRB2BTKCACNA1CCACNA1DCACNA1FCACNA1SCCR5CPT1BCPT2DPP4DRD1DRD2EGFRERBB2ERBB4HRH1HRH3HTR1AHTR2AHTR2BHTR2CHTR4JAK1JAK2JAK3MPLMTORPPIK3CAPIK3CBPIK3CDPIK3CGPIK3R1PIK3R2PIK3R3PIK3R5PPARGSLC6A2SLC6A3SLC6A4SMOTYK2pol
The experimentally established mechanism targets of Maleic Acid. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.
Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | SLC6A2 known ✓ | P23975 | 2/20 | 0.42 |
| ▸ | TSHR | P16473 | 3/20 | 0.53 |
| ▸ | NAPRT | Q6XQN6 | 2/20 | 0.53 |
| ▸ | TP53 | P04637 | 1/20 | 0.53 |
| ▸ | EGLN1 | Q9GZT9 | 1/20 | 0.53 |
| ▸ | EGLN3 | Q9H6Z9 | 1/20 | 0.53 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.53 |
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.47 |
| ▸ | KDM4E | B2RXH2 | 2/20 | 0.47 |
| ▸ | FTO | Q9C0B1 | 1/20 | 0.43 |
| ▸ | MEN1 | O00255 | 2/20 | 0.40 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.40 |
| ▸ | HCAR2 | Q8TDS4 | 4/20 | 0.39 |
| ▸ | HDAC3 | O15379 | 1/20 | 0.39 |
| ▸ | TNKS | O95271 | 1/20 | 0.39 |
| ▸ | HDAC4 | P56524 | 1/20 | 0.39 |
| ▸ | HDAC1 | Q13547 | 1/20 | 0.39 |
| ▸ | HDAC7 | Q8WUI4 | 1/20 | 0.39 |
| ▸ | HDAC2 | Q92769 | 1/20 | 0.39 |
| ▸ | HDAC10 | Q969S8 | 1/20 | 0.39 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Fumaric Acid SCHEMBL5875130 | 1.00 | TSHR (0.53) | TSHRNAPRTTP53EGLN1EGLN3 | |
| Fumaric Acid SCHEMBL1968079 | 1.00 | TSHR (0.53) | TSHRNAPRTTP53EGLN1EGLN3 | |
| Fumaric Acid SCHEMBL9762549 | 1.00 | TSHR (0.53) | TSHRNAPRTTP53EGLN1EGLN3 | |
| Fumaric Acid SCHEMBL1968077 | 1.00 | TSHR (0.53) | TSHRNAPRTTP53EGLN1EGLN3 | |
| Fumaric Acid SCHEMBL9761371 | 1.00 | TSHR (0.53) | TSHRNAPRTTP53EGLN1EGLN3 | |
| Maleic Acid SCHEMBL3669578 | 1.00 | TSHR (0.53) | TSHRNAPRTTP53EGLN1EGLN3 | |
| Fumaric Acid SCHEMBL9762551 | 1.00 | TSHR (0.53) | TSHRNAPRTTP53EGLN1EGLN3 | |
| Fumaric Acid SCHEMBL20184192 | 0.97 | TSHR (0.50) | TSHRNAPRTTP53EGLN1EGLN3 | |
| Maleic Acid SCHEMBL27512927 | 0.88 | TSHR (0.60) | TSHRNAPRTTP53EGLN1EGLN3 | |
| Fumaric Acid SCHEMBL27312490 | 0.88 | TSHR (0.60) | TSHRNAPRTTP53EGLN1EGLN3 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 8 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-104254535-B | Substituted pyrazolo [1,5 a] pyridine, its prepare and be used as the application of medicine | 埃斯蒂文博士实验室股份有限公司 | 2017-07-14 | — | — | CN | claimed |
| CN-119707787-A | Method for synthesizing 4-alkylpyridine compound by continuous light flow | 陕西师范大学 | 2025-03-28 | — | — | CN | disclosed |
| CN-104254535-B | Substituted pyrazolo [1,5 a] pyridine, its prepare and be used as the application of medicine | 埃斯蒂文博士实验室股份有限公司 | 2017-07-14 | — | — | CN | disclosed |
| EP-2336256-A1 | COMPOSITION FOR FORMING SILICON-CONTAINING RESIST UNDERLAYER FILM WITH ONIUM GROUP | Nissan Chemical Industries, Ltd. (JP) | 2011-06-22 | — | — | EP | disclosed |
| US-7166362-B2 | Film-forming composition, production process therefor, and porous insulating film | FUJI PHOTO FILM CO., LTD. (JP) | 2007-01-23 | — | — | US | disclosed |
| US-7128976-B2 | Composition for film formation, method of film formation, and silica-based film | JSR CORPORATION (JP) | 2006-10-31 | — | — | US | disclosed |
| US-20050074556-A1 | Film-forming composition, production process therefor, and porous insulating film | FUJI PHOTO FILM CO., LTD. | 2005-04-07 | — | — | US | disclosed |
| US-20030091838-A1 | Composition for film formation, method of film formation, and silica-based film | JSR CORPORATION (JP) | 2003-05-15 | — | — | US | disclosed |