Predicted protein targets (top 9)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | MAOB | P27338 | 1/20 | 0.36 |
| ▸ | POLB | P06746 | 1/20 | 0.35 |
| ▸ | NLRP3 | Q96P20 | 1/20 | 0.35 |
| ▸ | KDM4E | B2RXH2 | 2/20 | 0.33 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.33 |
| ▸ | HPGD | P15428 | 2/20 | 0.33 |
| ▸ | HSD17B10 | Q99714 | 2/20 | 0.33 |
| ▸ | USP2 | O75604 | 1/20 | 0.33 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.33 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL19678546 | 0.81 | MAOB (0.40) | MAOBPOLBNLRP3HSD17B10 | |
| SCHEMBL19678532 | 0.80 | MAOB (0.39) | MAOBPOLBNLRP3KDM4EALDH1A1 | |
| SCHEMBL19678534 | 0.80 | POLB (0.40) | MAOBPOLBNLRP3KDM4EHSD17B10 | |
| SCHEMBL25527385 | 0.80 | MAOB (0.39) | MAOBPOLBNLRP3 | |
| SCHEMBL19678548 | 0.79 | MAOB (0.38) | MAOBPOLBNLRP3KDM4E | |
| SCHEMBL19683836 | 0.78 | MAOB (0.37) | MAOBPOLBNLRP3KDM4EALDH1A1 | |
| SCHEMBL25527337 | 0.78 | MAOB (0.37) | MAOBPOLBNLRP3KDM4E | |
| SCHEMBL26343100 | 0.77 | POLB (0.32) | POLBNLRP3 | |
| SCHEMBL19678550 | 0.77 | MAOB (0.36) | MAOBPOLBNLRP3KDM4E | |
| SCHEMBL19683953 | 0.76 | MAOB (0.41) | MAOBPOLBNLRP3HSD17B10 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 15 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| WO-2024127977-A1 | RESIST COMPOSITION, RESIST PATTERN FORMATION METHOD, COMPOUND, AND ACID DIFFUSION CONTROL AGENT | 東京応化工業株式会社 | 2024-06-20 | — | — | WO | disclosed |
| US-20230384676-A1 | RADIATION-SENSITIVE RESIN COMPOSITION, METHOD OF FORMING PATTERN, POLYMER, AND COMPOUND | JSR CORPORATION (JP) | 2023-11-30 | — | — | US | disclosed |
| US-11774853-B2 | Resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-10-03 | — | — | US | disclosed |
| US-20230273519-A1 | RADIATION-SENSITIVE RESIN COMPOSITION AND PATTERN FORMATION METHOD | JSR CORPORATION (JP) | 2023-08-31 | — | — | US | disclosed |
| US-20230161255-A1 | POSITIVE RESIST COMPOSITION AND PATTERN FORMING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-05-25 | — | — | US | disclosed |
| US-20220299875-A1 | RADIATION-SENSITIVE RESIN COMPOSITION, AND METHOD FOR FORMING PATTERN | JSR CORPORATION (JP) | 2022-09-22 | — | — | US | disclosed |
| US-20220026803-A1 | RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2022-01-27 | — | — | US | disclosed |
| US-11204553-B2 | Chemically amplified resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2021-12-21 | — | — | US | disclosed |
| US-10809617-B2 | Resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2020-10-20 | — | — | US | disclosed |
| US-20200241418-A1 | POSITIVE RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2020-07-30 | — | — | US | disclosed |
| US-20200192222-A1 | RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2020-06-18 | — | — | US | disclosed |
| US-20200050104-A1 | CHEMICALLY AMPLIFIED RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2020-02-13 | — | — | US | disclosed |
| US-20190155155-A1 | RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2019-05-23 | — | — | US | disclosed |
| US-10295904-B2 | Resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2019-05-21 | — | — | US | disclosed |
| US-20170351177-A1 | RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2017-12-07 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (5 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-10809617-B2 | Resist composition and patterning process | INSR, EWSR1, INSRR | MAOB 2476/4885POLB 440/4885NLRP3 3141/4885 |
| US-20190155155-A1 | RESIST COMPOSITION AND PATTERNING PROCESS | INSR, EWSR1, INSRR | MAOB 2476/4885POLB 440/4885NLRP3 3141/4885 |
| US-20230384676-A1 | RADIATION-SENSITIVE RESIN COMPOSITION, METHOD OF FORMING PATTERN, POLYMER, AND COMPOUND | RER1, RFT1, RAD51 | MAOB 3559/4885POLB 1280/4885NLRP3 838/4885 |
| US-20170351177-A1 | RESIST COMPOSITION AND PATTERNING PROCESS | INSR, EWSR1, INSRR | MAOB 2476/4885POLB 440/4885NLRP3 3141/4885 |
| US-10295904-B2 | Resist composition and patterning process | INSR, EWSR1, INSRR | MAOB 2476/4885POLB 440/4885NLRP3 3141/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.