SCHEMBL19696686

SCHEMBL19696686

CC(C)CC(C)(C(=O)OCC1CC2CC(C#N)C1C2)C(C)C

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL24720156 0.85 — —
SCHEMBL19215159 0.82 — —
SCHEMBL24994360 0.79 HMGCR (0.37) —
SCHEMBL19134570 0.77 — —
SCHEMBL24994362 0.75 CYP2C9 (0.30) —
SCHEMBL20691730 0.72 — —
SCHEMBL23974122 0.70 ALDH1A1 (0.33) —
SCHEMBL25514831 0.67 ALDH1A1 (0.42) —
SCHEMBL19996966 0.67 — —
SCHEMBL25794309 0.67 MMP8 (0.31) —

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9841679-B2 Actinic ray-sensitive or radiation-sensitive resin composition, pattern forming method, method for manufacturing electronic device, and electronic device FUJIFILM CORPORATION (JP) 2017-12-12 — — US disclosed
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