⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL24994360 | 0.88 | HMGCR (0.37) | — | |
| SCHEMBL19134570 | 0.85 | — | — | |
| SCHEMBL19996966 | 0.83 | — | — | |
| SCHEMBL19696686 | 0.82 | — | — | |
| SCHEMBL24720156 | 0.79 | — | — | |
| SCHEMBL24994362 | 0.78 | CYP2C9 (0.30) | — | |
| SCHEMBL23974122 | 0.77 | ALDH1A1 (0.33) | — | |
| SCHEMBL20691730 | 0.77 | — | — | |
| SCHEMBL18844154 | 0.75 | — | — | |
| SCHEMBL18647978 | 0.75 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-10457761-B2 | Polymer, resist composition, and pattern forming process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2019-10-29 | — | — | US | disclosed |
| US-20170226250-A1 | POLYMER, RESIST COMPOSITION, AND PATTERN FORMING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2017-08-10 | — | — | US | disclosed |