Predicted protein targets (top 18)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | MTOR | P42345 | 1/20 | 0.39 |
| ▸ | ADK | P55263 | 1/20 | 0.39 |
| ▸ | NISCH | Q9Y2I1 | 1/20 | 0.39 |
| ▸ | ADRA2A | P08913 | 1/20 | 0.35 |
| ▸ | ADRA2C | P18825 | 1/20 | 0.35 |
| ▸ | ADRA1D | P25100 | 1/20 | 0.35 |
| ▸ | ADRA1A | P35348 | 1/20 | 0.35 |
| ▸ | ADRA1B | P35368 | 1/20 | 0.35 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.35 |
| ▸ | TAAR1 | Q96RJ0 | 3/20 | 0.34 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.33 |
| ▸ | TSHR | P16473 | 2/20 | 0.33 |
| ▸ | MEN1 | O00255 | 1/20 | 0.33 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.33 |
| ▸ | CYP2D6 | P10635 | 1/20 | 0.33 |
| ▸ | CYP2C9 | P11712 | 1/20 | 0.33 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.33 |
| ▸ | TP53 | P04637 | 1/20 | 0.32 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL6669434 | 0.84 | DYRK1A (0.39) | NISCHTP53 | |
| SCHEMBL11212021 | 0.73 | KDM4E (0.41) | ALDH1A1 | |
| SCHEMBL17508555 | 0.70 | CYP2A6 (0.39) | ADRA1ATAAR1ALDH1A1 | |
| SCHEMBL12575342 | 0.67 | TAAR1 (0.45) | ADRA1ATAAR1ALDH1A1TSHR | |
| SCHEMBL3757997 | 0.67 | CRHBP (0.36) | TAAR1ALDH1A1TSHR | |
| SCHEMBL11738521 | 0.63 | TP53 (0.36) | ADRA2AADRA2CADRA1DADRA1AADRA1B | |
| SCHEMBL356036 | 0.63 | CYP2A6 (0.36) | KMT2ATAAR1ALDH1A1TSHRMEN1 | |
| SCHEMBL29403344 | 0.63 | CYP2A6 (0.36) | KMT2ATAAR1ALDH1A1TSHRMEN1 | |
| SCHEMBL491288 | 0.61 | CYP1A2 (0.40) | TAAR1ALDH1A1TSHRTP53 | |
| 2-Phenylimidazole SCHEMBL1881537 | 0.60 | NISCH (0.95) | MTORADKNISCHADRA2AKMT2A |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 75 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| WO-2024135501-A1 | PHOTOSENSITIVE ELEMENT AND METHOD FOR FORMING RESIST PATTERN | 株式会社レゾナック | 2024-06-27 | — | — | WO | disclosed |
| CN-112987496-B | Photosensitive resin composition and transfer film using same | 旭化成株式会社 | 2024-06-14 | — | — | CN | disclosed |
| WO-2024116247-A1 | PHOTOSENSITIVE ELEMENT, METHOD FOR FORMING RESIST PATTERN, AND METHOD FOR MANUFACTURING PRINTED WIRING BOARD | 株式会社レゾナック | 2024-06-06 | — | — | WO | disclosed |
| WO-2024116513-A1 | PHOTOSENSITIVE ELEMENT, METHOD FOR FORMING RESIST PATTERN, AND METHOD FOR MANUFACTURING PRINTED WIRING BOARD | 株式会社レゾナック | 2024-06-06 | — | — | WO | disclosed |
| CN-118131567-A | Photosensitive resin composition, photosensitive element, method for forming resist pattern, and method for manufacturing printed wiring board | 株式会社力森诺科 | 2024-06-04 | — | — | CN | disclosed |
| CN-118043365-A | Polymer, photosensitive resin composition, photosensitive element, method for forming resist pattern, and method for forming wiring pattern | 株式会社力森诺科 | 2024-05-14 | — | — | CN | disclosed |
| EP-4357852-A1 | PHOTOSENSITIVE ELEMENT AND METHOD FOR PRODUCING PHOTOSENSITIVE ELEMENT | Resonac Corporation (JP) | 2024-04-24 | — | — | EP | disclosed |
| CN-112882342-B | Laminate body | 旭化成株式会社 | 2024-04-19 | — | — | CN | disclosed |
| CN-113412289-B | Photosensitive resin composition, photosensitive element, method for forming resist pattern, and method for manufacturing printed wiring board | 株式会社力森诺科 | 2024-04-05 | — | — | CN | disclosed |
| US-20240111211-A1 | PHOTOSENSITIVE RESIN FILM, RESIST PATTERN FORMING METHOD, AND WIRING PATTERN FORMING METHOD | RESONAC CORPORATION (JP) | 2024-04-04 | — | — | US | disclosed |
| CN-111492309-A | Photosensitive resin laminate | 旭化成株式会社 | 2020-08-04 | — | — | CN | disclosed |
| WO-2020032133-A1 | PHOTOSENSITIVE RESIN COMPOSITION AND METHOD FOR FORMING RESIST PATTERN | 旭化成株式会社 | 2020-02-13 | — | — | WO | disclosed |
| WO-2019244724-A1 | PHOTOSENSITIVE RESIN COMPOSITION AND RESIST PATTERN FORMATION METHOD | 旭化成株式会社 | 2019-12-26 | — | — | WO | disclosed |
| CN-107924128-A | Photosensitive polymer combination | 旭化成株式会社 | 2018-04-17 | — | — | CN | disclosed |
| US-8088559-B2 | Method of making a photopolymer printing plate | AGFA GRAPHICS NV (BE) | 2012-01-03 | — | — | US | disclosed |
| EP-1952201-B1 | METHOD OF MAKING A PHOTOPOLYMER PRINTING PLATE | AGFA GRAPHICS NV (BE) | 2011-01-12 | — | — | EP | disclosed |
| EP-1788430-B1 | Method of making a lithographic printing plate | AGFA GRAPHICS NV (BE) | 2009-03-18 | — | — | EP | disclosed |
| US-20080311525-A1 | Method of Making a Photopolymer Printing Plate | AGFA GRAPHICS NV (BE) | 2008-12-18 | — | — | US | disclosed |
| EP-1788430-A1 | Method of making a lithographic printing plate | Agfa Graphics N.V. (BE) | 2007-05-23 | — | — | EP | disclosed |
| US-4434223-A | PHOTOPOLYMERIZABLE, PRINTING PLATES | TOPPAN PRINTING CO., LTD. (JP) | 1984-02-28 | — | — | US | disclosed |