⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Trifluoromethanesulfonic Acid SCHEMBL1967557 | 0.83 | ACHE (0.35) | — | |
| Hydrochloric Acid SCHEMBL1973964 | 0.81 | — | — | |
| SCHEMBL1972701 | 0.79 | — | — | |
| SCHEMBL16286336 | 0.70 | — | — | |
| Hydrochloric Acid SCHEMBL14990865 | 0.68 | — | — | |
| Trifluoroacetic Acid SCHEMBL1968494 | 0.68 | — | — | |
| Trifluoroacetic Acid SCHEMBL6115378 | 0.68 | KMT2A (0.41) | — | |
| Acetic Acid SCHEMBL1968637 | 0.67 | ALDH1A1 (0.32) | — | |
| SCHEMBL1974160 | 0.66 | — | — | |
| Trifluoroacetic Acid SCHEMBL16699833 | 0.65 | CHRM2 (0.42) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8864894-B2 | Resist underlayer film forming composition containing silicone having onium group | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2014-10-21 | — | — | US | disclosed |
| EP-2336256-A1 | COMPOSITION FOR FORMING SILICON-CONTAINING RESIST UNDERLAYER FILM WITH ONIUM GROUP | Nissan Chemical Industries, Ltd. (JP) | 2011-06-22 | — | — | EP | disclosed |
| US-20110143149-A1 | RESIST UNDERLAYER FILM FORMING COMPOSITION CONTAINING SILICONE HAVING ONIUM GROUP | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2011-06-16 | — | — | US | disclosed |