Predicted protein targets (top 9)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | NCEH1 | Q6PIU2 | 2/20 | 0.44 |
| ▸ | TBXA2R | P21731 | 3/20 | 0.36 |
| ▸ | MGLL | Q99685 | 2/20 | 0.36 |
| ▸ | MAP2K1 | Q02750 | 8/20 | 0.34 |
| ▸ | F2 | P00734 | 1/20 | 0.33 |
| ▸ | PLG | P00747 | 1/20 | 0.33 |
| ▸ | PLAU | P00749 | 1/20 | 0.33 |
| ▸ | KLKB1 | P03952 | 1/20 | 0.33 |
| ▸ | PRSS1 | P07477 | 1/20 | 0.33 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL19712913 | 0.93 | NCEH1 (0.49) | NCEH1MGLLF2PLGPLAU | |
| SCHEMBL19712952 | 0.90 | NCEH1 (0.35) | NCEH1MGLL | |
| SCHEMBL19712896 | 0.88 | NCEH1 (0.45) | NCEH1MGLLF2PLGPLAU | |
| SCHEMBL17825877 | 0.87 | NCEH1 (0.49) | NCEH1TBXA2RMGLL | |
| SCHEMBL19712898 | 0.87 | NCEH1 (0.44) | NCEH1TBXA2RMGLLF2PLG | |
| SCHEMBL19712923 | 0.83 | NCEH1 (0.40) | NCEH1TBXA2RMGLLMAP2K1 | |
| SCHEMBL20484105 | 0.81 | NCEH1 (0.42) | NCEH1TBXA2RMGLLMAP2K1F2 | |
| SCHEMBL19712947 | 0.75 | NCEH1 (0.48) | NCEH1 | |
| SCHEMBL19712933 | 0.75 | FAAH (0.40) | NCEH1 | |
| SCHEMBL20483985 | 0.73 | NCEH1 (0.44) | NCEH1TBXA2RMGLL |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-11267943-B2 | Film structure containing a photopolymer layer for holographic exposure and a coating layer of high resistance | COVESTRO DEUTSCHLAND AG (DE) | 2022-03-08 | — | — | US | disclosed |
| US-20210292505-A1 | FILM STRUCTURE CONTAINING A PHOTOPOLYMER LAYER FOR HOLOGRAPHIC EXPOSURE AND A COATING LAYER OF HIGH RESISTANCE | COVESTRO DEUTSCHLAND AG (DE) | 2021-09-23 | — | — | US | disclosed |
| US-20200166888-A1 | HOLOGRAPHIC MEDIUM CONTAINING A PHOTOPOLYMER LAYER FOR HOLOGRAPHIC EXPOSURE AND A HIGHLY RESISTANT COATING LAYER | COVESTRO DEUTSCHLAND AG (DE) | 2020-05-28 | — | — | US | disclosed |
| US-10241402-B2 | Naphthyl acrylates as writing monomers for photopolymers | COVESTRO DEUTSCHLAND AG (DE) | 2019-03-26 | — | — | US | disclosed |
| US-20170363957-A1 | NAPHTHYL ACRYLATES AS WRITING MONOMERS FOR PHOTOPOLYMERS | COVESTRO DEUTSCHLAND AG (DE) | 2017-12-21 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20170363957-A1 | NAPHTHYL ACRYLATES AS WRITING MONOMERS FOR PHOTOPOLYMERS | NEFM, ACR, DIAPH1 | NCEH1 4259/4885TBXA2R 3075/4885MGLL 2733/4885 |
| US-10241402-B2 | Naphthyl acrylates as writing monomers for photopolymers | NEFM, ACR, DIAPH1 | NCEH1 4259/4885TBXA2R 3075/4885MGLL 2733/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.