SCHEMBL19712928

SCHEMBL19712928

C=C(C)C(=O)OCCNC(=O)Oc1ccc2cc(Cl)ccc2c1-c1c(OC(=O)NCCOC(=O)C(=C)C)ccc2cc(Cl)ccc12

nearest known ligand 0.45

Predicted protein targets (top 4)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 1/20 0.38
LMNA P02545 1/20 0.38
POLB P06746 1/20 0.38
L3MBTL1 Q9Y468 1/20 0.37

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL19712955 0.92 NCEH1 (0.44) ALDH1A1LMNAPOLB
SCHEMBL13380544 0.84 NCEH1 (0.49) ALDH1A1LMNA
SCHEMBL19712954 0.83 NCEH1 (0.42) ALDH1A1
SCHEMBL19712899 0.83 NCEH1 (0.42) ALDH1A1
SCHEMBL19712925 0.83 NCEH1 (0.47) ALDH1A1LMNAL3MBTL1
SCHEMBL17350739 0.82 KDM4E (0.43) ALDH1A1LMNAL3MBTL1
SCHEMBL19712921 0.81 NCEH1 (0.40) ALDH1A1
SCHEMBL12391255 0.80 NCEH1 (0.41) ALDH1A1
SCHEMBL19712907 0.80 NCEH1 (0.44) LMNAL3MBTL1
SCHEMBL19712923 0.80 NCEH1 (0.40) POLB

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11267943-B2 Film structure containing a photopolymer layer for holographic exposure and a coating layer of high resistance COVESTRO DEUTSCHLAND AG (DE) 2022-03-08 US disclosed
US-20210292505-A1 FILM STRUCTURE CONTAINING A PHOTOPOLYMER LAYER FOR HOLOGRAPHIC EXPOSURE AND A COATING LAYER OF HIGH RESISTANCE COVESTRO DEUTSCHLAND AG (DE) 2021-09-23 US disclosed
US-20200166888-A1 HOLOGRAPHIC MEDIUM CONTAINING A PHOTOPOLYMER LAYER FOR HOLOGRAPHIC EXPOSURE AND A HIGHLY RESISTANT COATING LAYER COVESTRO DEUTSCHLAND AG (DE) 2020-05-28 US disclosed
US-10241402-B2 Naphthyl acrylates as writing monomers for photopolymers COVESTRO DEUTSCHLAND AG (DE) 2019-03-26 US disclosed
US-20170363957-A1 NAPHTHYL ACRYLATES AS WRITING MONOMERS FOR PHOTOPOLYMERS COVESTRO DEUTSCHLAND AG (DE) 2017-12-21 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20170363957-A1 NAPHTHYL ACRYLATES AS WRITING MONOMERS FOR PHOTOPOLYMERS NEFM, ACR, DIAPH1 ALDH1A1 1558/4885LMNA 1044/4885POLB 1931/4885
US-10241402-B2 Naphthyl acrylates as writing monomers for photopolymers NEFM, ACR, DIAPH1 ALDH1A1 1558/4885LMNA 1044/4885POLB 1931/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.