SCHEMBL19712938

SCHEMBL19712938

[CH2]CNC(=O)Oc1ccc2ccccc2c1-c1c(OC(=O)NC[CH2])ccc2cc(F)ccc12

nearest known ligand 0.55

Predicted protein targets (top 16)

geneUniProtsupporting neighboursconfidence
NCEH1 Q6PIU2 6/20 0.44
ALDH1A1 P00352 1/20 0.40
PGR P06401 1/20 0.40
GAA P10253 1/20 0.40
PTGS1 P23219 1/20 0.40
MAPK1 P28482 1/20 0.40
HSD17B10 Q99714 1/20 0.40
FAAH O00519 2/20 0.39
CES2 O00748 1/20 0.38
CYP1A2 P05177 1/20 0.37
CYP2A6 P11509 1/20 0.37
MAPT P10636 2/20 0.36
MAPK14 Q16539 1/20 0.36
NPC1 O15118 1/20 0.35
RAB9A P51151 1/20 0.35
SMN1; SMN2 Q16637 1/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL19712933 0.94 FAAH (0.40) NCEH1FAAHCES2CYP1A2CYP2A6
SCHEMBL19712917 0.89 NCEH1 (0.53) NCEH1ALDH1A1PGRGAAPTGS1
SCHEMBL19712900 0.86 NCEH1 (0.44) NCEH1ALDH1A1PGRGAAPTGS1
SCHEMBL19712941 0.86 NCEH1 (0.44) NCEH1ALDH1A1PGRGAAPTGS1
SCHEMBL19712944 0.86 NCEH1 (0.50) NCEH1MAPTNPC1RAB9ASMN1; SMN2
SCHEMBL19712898 0.84 NCEH1 (0.44) NCEH1FAAH
SCHEMBL19712896 0.83 NCEH1 (0.45) NCEH1NPC1RAB9A
SCHEMBL29549014 0.82 NCEH1 (0.41) NCEH1ALDH1A1PGRGAAPTGS1
SCHEMBL19712899 0.81 NCEH1 (0.42) NCEH1ALDH1A1PGRGAAPTGS1
SCHEMBL29622104 0.81 NCEH1 (0.41) NCEH1ALDH1A1PGRGAAPTGS1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11267943-B2 Film structure containing a photopolymer layer for holographic exposure and a coating layer of high resistance COVESTRO DEUTSCHLAND AG (DE) 2022-03-08 US disclosed
US-20210292505-A1 FILM STRUCTURE CONTAINING A PHOTOPOLYMER LAYER FOR HOLOGRAPHIC EXPOSURE AND A COATING LAYER OF HIGH RESISTANCE COVESTRO DEUTSCHLAND AG (DE) 2021-09-23 US disclosed
US-10241402-B2 Naphthyl acrylates as writing monomers for photopolymers COVESTRO DEUTSCHLAND AG (DE) 2019-03-26 US disclosed
US-20170363957-A1 NAPHTHYL ACRYLATES AS WRITING MONOMERS FOR PHOTOPOLYMERS COVESTRO DEUTSCHLAND AG (DE) 2017-12-21 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20170363957-A1 NAPHTHYL ACRYLATES AS WRITING MONOMERS FOR PHOTOPOLYMERS NEFM, ACR, DIAPH1 NCEH1 4259/4885ALDH1A1 1558/4885PGR 1480/4885
US-10241402-B2 Naphthyl acrylates as writing monomers for photopolymers NEFM, ACR, DIAPH1 NCEH1 4259/4885ALDH1A1 1558/4885PGR 1480/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.